SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS
申请人:JSR Corporation
公开号:EP1586570A1
公开(公告)日:2005-10-19
A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator.
The sulfonium salt compound is shown by the following formula (I),
wherein R1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or -OR3 group, wherein R3 is a monovalent alicyclic hydrocarbon group, R2 represents a (substituted)-alkyl group or two or more R2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X- indicates a sulfonic acid anion.
The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.
一种锍盐化合物,对波长 220 纳米以下的深紫外线具有优异的透明性,用作光酸发生器时,在灵敏度、分辨率、图案形状、LER 和储存稳定性等方面表现出均衡的优异性能;一种包含该锍盐化合物的光酸发生器;以及一种包含该光酸发生器的正色调辐射敏感树脂组合物。
锍盐化合物如下式(I)所示、
其中 R1 代表卤素原子、烷基、一价脂环烃基、烷氧基或 -OR3 基团,其中 R3 是一价脂环烃基,R2 代表(取代的)烷基或两个或多个 R2 基团形成环状结构,p 是 0-7,q 是 0-6,n 是 0-3,X- 表示磺酸阴离子。
正色调辐射敏感树脂组合物包括 (A) 锍盐化合物的光酸发生器和 (B) 含酸可分解基团的树脂。