2-chloro-9,10-dimethoxyanthracene | 56971-01-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 2-chloro-9,10-dimethoxyanthracene
• CAS: 56971-01-8
• 化学式: C₁₆H₁₃ClO₂
• 分子量: 272.731
• InChiKey: SQLIUQWZSOABAR-UHFFFAOYSA-N

物化性质

• 熔点：
  154.5-155.5 °C
• 沸点：
  440.4±25.0 °C(Predicted)
• 密度：
  1.253±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  5
• 重原子数：
  19
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.12
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  2-chloro-9,10-dimethoxyanthracene 在 ammonium hydroxide 、 copper diacetate 、 氧气 、 magnesium 作用下， 以 甲醇 为溶剂， 反应 2.0h， 生成 2-(9,10-dimethoxyanthracenyl) tert-butyl nitroxide
  参考文献：
  名称：

  2-(9,10-二甲氧基蒽基)-叔丁基硝基氧化物。单线态氧的 ESR 光谱指示剂

  摘要：

  Synthese dunitroxle du titre et reaction de celui-ci avec l'oxygene singulet conduisant a un endoperoxyde

  DOI：

  10.1021/ja00303a046
• 作为产物：
  描述：

  2-氯蒽醌 在 sodium hydroxide 、 sodium dithionite 作用下， 以 水 为溶剂， 生成 2-chloro-9,10-dimethoxyanthracene
  参考文献：
  名称：

  2-(9,10-二甲氧基蒽基)-叔丁基硝基氧化物。单线态氧的 ESR 光谱指示剂

  摘要：

  Synthese dunitroxle du titre et reaction de celui-ci avec l'oxygene singulet conduisant a un endoperoxyde

  DOI：

  10.1021/ja00303a046

文献信息

• Direct Synthesis of Hydroquinones from Quinones through Sequential and Continuous‐Flow Hydrogenation‐Derivatization Using Heterogeneous Au–Pt Nanoparticles as Catalysts
  作者：Hiroyuki Miyamura、Fumiya Tobita、Aya Suzuki、Shū Kobayashi

  DOI：10.1002/anie.201904159

  日期：2019.7

  Pt–Au bimetallic nanoparticle catalysts immobilized on dimethyl polysilane (Pt–Au/(DMPSi‐Al2O3)) have been developed for selective hydrogenation of quinones to hydroquinones. High reactivity, selectivity, and robustness of the catalysts were confirmed under continuous‐flow conditions. Various direct derivatizations of quinones, such as methylation, acetylation, trifluoromethanesulfonylation, methacrylation

  固定在二甲基聚硅烷上的Pt-Au双金属纳米颗粒催化剂（Pt-Au /（DMPSi-Al 2 O 3））已开发用于将醌选择性加氢为对苯二酚。在连续流动条件下证实了催化剂的高反应活性，选择性和坚固性。在连续和连续流动条件下成功进行了醌的各种直接衍生化反应，例如甲基化，乙酰化，三氟甲磺酰化，甲基丙烯酸化和苯甲酰化，以良好的产率提供了所需的产品，甚至具有优异的收率。尤其是，对空气敏感的氢醌，如蒽氢醌和萘氢醌，可以在封闭的连续和连续流动条件下成功生成并衍生化而不会分解。
• COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20160046552A1

  公开（公告）日：2016-02-18

  A composition containing a novel vinyl-group-containing compound. This composition contains a vinyl-group-containing compound represented by general formula (1). In the formula: W 1 and W 2 represent a group represented by general formula (2) (where a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or —S—, R 1 is a single bond or a C1-4 alkylene group, R 2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer equal to 0 or higher), a group represented by general formula (4) (where the ring (Z), X, R 1 , R 2 , and m are as previously stated), a hydroxyl group, or a (meth)acryloyloxy group; rings (Y 1 , Y 2 ) are aromatic hydrocarbon rings; R represents a single bond or a specific divalent group; R 3a and R 3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon group; and n1 and n2 are integers of 0-4.

  这个组合物包含一种含有新颖乙烯基团的化合物。该组合物包含一个由通式（1）表示的含有乙烯基团的化合物。在该式中：W1和W2代表由通式（2）表示的一个基团（其中环（Z）是芳香烃环，X是一个单键或—S—，R1是一个单键或C1-4烷基基团，R2是特定的取代基团，如一价碳氢化合物，m是大于或等于0的整数），一个由通式（4）表示的基团（其中环（Z）、X、R1、R2和m如前述），一个羟基，或一个（甲基）丙烯酰氧基团；环（Y1、Y2）是芳香烃环；R代表一个单键或一个特定的二价基团；R3a和R3b代表氰基、卤素原子或一价碳氢基团；n1和n2是0-4的整数。
• NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：EP2725423A1

  公开（公告）日：2014-04-30

  Provided are: a negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure; a pattern forming method using the negative-type photosensitive resin composition; a cured film, an insulating film, and a color filter formed using the negative-type photosensitive resin composition; and a display device provided with the cured film, insulating film, or color filter. The negative-type photosensitive resin composition according to the present invention contains a compound represented by the following formula (1). In the formula, R1 and R2 each independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. R1 and R2 may be bonded to form a ring structure and may contain a hetero atom bond. R3 indicates a single bond or an organic group. R4 to R9 each independently indicate a hydrogen atom, an organic group, etc., but R6 and R7 are never hydroxyl groups. R10 indicates a hydrogen atom or an organic group.

  本发明提供了：一种负型感光树脂组合物，该组合物能够在低光曝光下形成具有良好粘合性的图案；一种使用该负型感光树脂组合物的图案形成方法；一种使用该负型感光树脂组合物形成的固化薄膜、绝缘薄膜和彩色滤光片；以及一种装有该固化薄膜、绝缘薄膜或彩色滤光片的显示装置。根据本发明的负型感光树脂组合物含有下式（1）表示的化合物。式中，R1 和 R2 各自独立地表示氢原子或有机基团，但至少有一个表示有机基团。R1 和 R2 可以键合形成环状结构，也可以含有杂原子键。R3 表示单键或有机基团。R4 至 R9 各自独立地表示氢原子、有机基团等，但 R6 和 R7 绝不是羟基。R10 表示氢原子或有机基团。
• PHOTOSENSITIVE RESIN COMPOSITION, RESIST LAMINATE, AND ARTICLES OBTAINED BY CURING SAME (7)
  申请人：Nippon Kayaku Kabushiki Kaisha

  公开号：EP2924504A1

  公开（公告）日：2015-09-30

  The purpose of the present invention is to provide the following: a photosensitive epoxy resin composition that, via photolithography, can form a high-resolution, low-stress image that has vertical side walls and resists moisture and heat, and/or a resist laminate using said photosensitive epoxy resin composition; and an article or articles obtained by curing said photosensitive epoxy resin composition and/or resist laminate. The present invention is a photosensitive resin composition containing the following: an epoxy resin (A), a polyhydric phenol compound (B) having a specific structure, a cationic-polymerization photoinitiator (C), a silane compound (D) containing an epoxy group, and a reactive epoxy monomer (E) having a specific structure. The epoxy resin (A) contains the phenol derivative represented by formula (1), an epoxy resin (a) obtained via a reaction with epihalohydrin, and an epoxy resin (b) that can be represented by formula (2). The reactive epoxy monomer (E) is a bisphenol epoxy resin.

  本发明的目的是提供以下内容：一种光敏环氧树脂组合物，该组合物通过光刻技术可形成高分辨率、低应力的图像，该图像具有垂直侧壁并可防潮防热，和/或使用所述光敏环氧树脂组合物的抗蚀层压板；以及通过固化所述光敏环氧树脂组合物和/或抗蚀层压板获得的一种或多种物品。本发明是一种光敏树脂组合物，含有以下成分：环氧树脂（A）、具有特定结构的多氢苯酚化合物（B）、阳离子聚合光引发剂（C）、含有环氧基团的硅烷化合物（D）和具有特定结构的活性环氧单体（E）。环氧树脂（A）包含由式（1）表示的苯酚衍生物、通过与表卤醇反应得到的环氧树脂（a）以及可由式（2）表示的环氧树脂（b）。活性环氧单体（E）是双酚环氧树脂。
• PHOTOSENSITIVE RESIN COMPOSITION, RESIST LAMINATE, AND ARTICLES OBTAINED BY CURING SAME (5)
  申请人：Nippon Kayaku Kabushiki Kaisha

  公开号：EP2924505A1

  公开（公告）日：2015-09-30

  The purpose of the present invention is to provide the following: a photosensitive epoxy resin composition that, via photolithography, can form a high-resolution, low-stress image that has vertical side walls and resists moisture and heat, and/or a resist laminate using said photosensitive epoxy resin composition; and an article or articles obtained by curing said photosensitive epoxy resin composition and/or resist laminate. The present invention is a photosensitive resin composition containing the following: an epoxy resin (A), a polyol compound (B) having a specific structure, a cationic-polymerization photoinitiator (C), a silane compound (D) containing an epoxy group, and a reactive epoxy monomer (E) having a specific structure. The epoxy resin (A) contains the phenol derivative represented by formula (1), an epoxy resin (a) obtained via a reaction with epihalohydrin, and an epoxy resin (b) that can be represented by formula (2).

  本发明的目的是提供以下内容：一种光敏环氧树脂组合物，该组合物通过光刻技术可形成具有垂直侧壁且耐湿耐热的高分辨率、低应力图像，和/或使用所述光敏环氧树脂组合物的抗蚀层压板；以及通过固化所述光敏环氧树脂组合物和/或抗蚀层压板获得的一种或多种物品。本发明是一种光敏树脂组合物，含有以下成分：环氧树脂（A）、具有特定结构的多元醇化合物（B）、阳离子聚合光引发剂（C）、含有环氧基团的硅烷化合物（D）和具有特定结构的活性环氧单体（E）。环氧树脂（A）包含由式（1）表示的苯酚衍生物、通过与表卤醇反应得到的环氧树脂（a）以及可由式（2）表示的环氧树脂（b）。