ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20210179554A1
公开(公告)日:2021-06-17
An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.
Fluorodecarboxylation: Synthesis of aryl trifluoromethyl ethers (ArOCF3) and thioethers (ArSCF3)
作者:Sankarganesh Krishanmoorthy、Simon D. Schnell、Huong Dang、Fang Fu、G.K. Surya Prakash
DOI:10.1016/j.jfluchem.2017.07.017
日期:2017.11
Fluorodecarboxylation of aryloxydifluoroacetic acid (ArOCF2CO2H) and arylmercaptodifluoroacetic acid (ArSCF2CO2H) towards ArXCF3 (X = O, S) using silver (I) salts in the presence of Selectfluor in a biphasic system with trifluoroacetic acid additive is discussed.
在具有三氟乙酸添加剂的双相体系中,在Selectfluor的存在下,使用银(I)盐存在下,使用银(I)盐将芳氧基二氟乙酸(ArOCF 2 CO 2 H)和芳基巯基二氟乙酸(ArSCF 2 CO 2 H)朝ArXCF 3(X = O,S)进行氟羧化讨论。