The present invention relates to a heterocycle-containing iodonium salt useful as, for example, a cationic photopolymerization initiator and an acid generator for a chemically amplified resist, shown by the general formula [35]:
[wherein R26 and R27 are each independently an aryl group which may have a halogen atom or a lower alkyl group as a substituent, a group shown by the above-mentioned general formula [2]:
or a group shown by the general formula [3]:
A3 is a halogen atom or an anion derived from an inorganic strong acid, an organic acid or a compound shown by the general formula [4]:
HM1(R7)4 [4]
(wherein M1 is a boron atom or a gallium atom; and R7 is an aryl group); and provided that at least one of R26 and R27. is a group shown by the above-mentioned general formula [2] or [3], and when only one of R26 and R27 is a group shown by the above-mentioned general formula [2] or [3], A3 is an anion derived from an inorganic strong acid shown by the general formula [36];
HM3F6 [36]
(wherein M3 is a phosphorus atom, an arsenic atom or an antimony atom), an organic acid or a compound shown by the general formula [4])]
本发明涉及一种含杂环的
碘盐,可用作阳离子光聚合
引发剂和
化学放大抗蚀剂的酸发生剂等,其通式为[35]:
[其中 R26 和 R27 各自独立地为芳基,该芳基可以有一个卤素原子或一个低级烷基作为取代基,该基团如上述通式[2]所示:
或通式[3]所示的基团:
A3 是一个卤素原子或一个来自无机强酸、有机酸或通式[4]所示化合物的阴离子:
HM1(R7)4 [4].
(其中M1是
硼原子或
镓原子;R7是芳基);并且R26和R27中至少有一个是上述通式[2]或[3]所示的基团,当R26和R27中只有一个是上述通式[2]或[3]所示的基团时,A3是衍生自通式[36]所示的无机强酸的阴离子;
HM3F6 [36]
(其中 M3 是
磷原子、
砷原子或
锑原子)、有机酸或通式[4]所示的化合物)]。