2-oxo-2H-chromen-4-yl butane-1-sulfonate | 676515-69-8

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 香豆素及其衍生物
• 英文名称: 2-oxo-2H-chromen-4-yl butane-1-sulfonate
• 英文别名: 2-Oxo-2H-1-benzopyran-4-yl butane-1-sulfonate；(2-oxochromen-4-yl) butane-1-sulfonate
• CAS: 676515-69-8
• 化学式: C₁₃H₁₄O₅S
• 分子量: 282.317
• InChiKey: TWWXUKZUVVLNTI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  19
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.31
• 拓扑面积：
  78
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为产物：
  描述：

  4-羟基香豆素 、 1-丁基磺酰氯 在 三乙胺 作用下， 以 四氢呋喃 为溶剂， 反应 4.0h， 以78%的产率得到2-oxo-2H-chromen-4-yl butane-1-sulfonate
  参考文献：
  名称：

  Coumarin sulfonates: As potential leads for ROS inhibition

  摘要：

  Coumarin sulfonates 4-43 were synthesized by reacting 3-hydroxy coumarin 1, 4-hydroxy coumarin 2 and 6-hydroxy coumarin 3 with different substituted sulfonyl chlorides and subjected to evaluate for their in vitro immunomodulatory potential. The compounds were investigated for their effect on oxidative burst activity of zymosan stimulated whole blood phagocytes using a luminol enhanced chemiluminescence technique. Ibuprofen was used as standard drug (IC50 = 54.2 +/- 9.2 mu M). Eleven compounds 6 (IC50 = 46.60 +/- 14.6 mu M), 8 (IC50 = 11.50 +/- 6.5 mu M), 15 (IC50 = 21.40 +/- 12.2 mu M), 19 (IC50 = 5.75 +/- 0.86 mu M), 22 (IC50 = 10.27 +/- 1.06 mu M), 23 (IC50 = 33.09 +/- 5.61 mu M), 24 (IC50 = 4.93 +/- 0.58 mu M), 25 (IC50 = 21.96 +/- 14.74 mu M), 29 (IC50 = 12.47 +/- 9.2 mu M), 35 (IC50 = 20.20 +/- 13.4 mu M) and 37 (IC50 = 14.47 +/- 5.02 mu M) out of forty demonstrated their potential suppressive effect on production of reactive oxygen species (ROS) as compared to ibuprofen. All the synthetic derivatives 4-43 were characterized by different available spectroscopic techniques such as H-1 NMR, C-13 NMR, EIMS and HRMS. CHN analysis was also performed. (C) 2016 Elsevier Inc. All rights reserved.

  DOI：

  10.1016/j.bioorg.2016.09.006

文献信息

• Near Infrared Ray Activation Type Positive Resin Composition
  申请人：Imai Genji

  公开号：US20070259279A1

  公开（公告）日：2007-11-08

  A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.
• Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same
  申请人：Imai Genji

  公开号：US20090045552A1

  公开（公告）日：2009-02-19

  Provided are a positive resist composition for recording medium master showing excellent plating resistance and adhesion to a base plate such as glass or the like characterized by containing a vinyl polymer which has a monomer unit having an alkali-soluble group blocked by an alkyl vinyl ether, and a method of producing a recording medium master or stamper using this positive resist composition.
• US7544461B2
  申请人：——

  公开号：US7544461B2

  公开（公告）日：2009-06-09