申请人:——
公开号:US20040002007A1
公开(公告)日:2004-01-01
New oxime sulfonate compounds of the formula I, II, III, IV, V, VI and VII
1
2
R
1
is for example C
1
-C
18
alkylsulfonyl, R
2
is halogen or C
1
-C
10
haloalkyl; R
3
is for example unsubstituted or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar
1
is for example a direct bond, C
1
-C
12
alkylene; —O—C—bond or a —0—Si-bond which cleaves upon the action of an acid; A
1
, A
2
, A
3
, A
4
, A
5
, A
6
, A
7
, A
8
, A
9
, A
10
, A
11
and A
12
are for example a direct bond, —O—, or —S—, or are C
1
-C
12
alkylene or phenylene unsubstituted or substituted; Y
1
is C
1
-C
12
alkylene which is for example substituted by OR
4
, or SR
7
; Y
2
is e.g. a trivalent radical of C
1
-C
12
alkylene; Y
3
is e.g. a tetravalent radical of C
1
-C
12
alkylene; X is halogen; Ar′
1
is for example C
1
-C
12
alkyl which is unsubstituted or substituted; Ar″
1
is for example phenylene; provided that at least one of the radicals Ar′
1
, Ar″
1
, is substituted by 1 to 3 groups of
3
is for example halogen; R
15
, R
16
, R
17
and R
18
e.g. hydrogen or phenyl; R
19
, R
20
, R
21
, R
22
and R
23
are e.g. phenyl; are especially suitable for the preparation of photoresists.
公式I、II、III、IV、V、VI和VII的新氧肟磺酸盐化合物,其中12R1例如C1-C18烷基磺酰基,R2为卤素或C1-C10卤基烷基;R3例如未取代或取代的苯基二磺酰基,二苯基二磺酰基或氧二苯基二磺酰基;Ar1例如直接键,C1-C12烷基,—O—C—键或在酸作用下断裂的—0—Si键;A1、A2、A3、A4、A5、A6、A7、A8、A9、A10、A11和A12例如直接键,—O—或—S—,或是未取代或取代的C1-C12烷基或苯基;Y1例如C1-C12烷基,例如被OR4或SR7取代;Y2例如C1-C12烷基的三价基团;Y3例如C1-C12烷基的四价基团;X是卤素;Ar′1例如未取代或取代的C1-C12烷基;Ar″1例如苯基;至少一个Ar′1、Ar″1基团被1至3个3例如卤素取代;R15、R16、R17和R18例如氢或苯基;R19、R20、R21、R22和R23例如苯基;特别适用于光刻胶的制备。