申请人:BANYU PHARMACEUTICAL CO., LTD.
公开号:EP0645369A2
公开(公告)日:1995-03-29
The invention relates to compounds of the formula
wherein R11 is a hydrogen atom, a lower alkyl group, a halo lower alkyl group, a lower alkenyl group, a lower alkynyl group or a cycloalkyl group; R21 is a hydrogen atom or a group of the formula
wherein each of R3, R31 and R32, which may be the same or different, is a hydrogen atom or a lower alkyl group, each of R4, R5, R41 and R51, which may be the same or different, is a hydrogen atom, a halogen atom, a hydroxyl group, a lower alkyl group or a lower alkoxy group, and R42 is a hydroxyl group, a halogen atom, a group of the formula B-O (wherein B is a protecting group for a hydroxyl group), a hydroxy methyl group, a formyl group, a carboxyl group, a lower alkoxy carbonyl group, a lower alkanoyl group, an amino group, a mercapto group or a group of the formula R6-X-Y-(wherein R6 is a phenyl or thienyl group which may have one or two substituents selected from the group consisting of a halogen atom, a hydroxyl group, a lower one or two substituents selected from the group consisting of a halogen atom, a hydroxyl group, a lower alkyl group, a cyano group, a lower alkoxy group and a heterocyclic group, each of X and Y, which may be the same or different, is an oxygen atom, a sulfur atom, a carbonyl group, a group of the formula -CHRa- (wherein Ra is a hydrogen atom or a lower alkyl group) or a group of the formula -NRb- (wherein Rb is a hydrogen atom or a lower alkyl group), or X and Y together form a vinylene group or an ethynylene group), provided that when either one of X and Y is an oxygen atom, a sulfur atom or a group of the formula -NRb- (wherein Rb is as defined above), the other is a carbonyl group or a group of the formula -CHRa- (wherein Ra is as defined above), and W is a halogen atom, and a process for preparing such compounds.
本发明涉及式如下的化合物
其中 R11 是氢原子、低级烷基、卤代低级烷基、低级烯基、低级炔基或环烷基; R21 是氢原子或式中的基团
其中 R3、R31 和 R32(可以相同或不同)各自是氢原子或低级烷基,R4、R5、R41 和 R51(可以相同或不同)各自是氢原子、卤素原子、羟基、低级烷基或低级烷氧基,R42 是羟基、卤素原子、式 B-O 的基团(其中 B 是羟基的保护基)、羟甲基、甲酰基、羧基、低级烷氧基羰基、低级烷酰基、氨基、巯基或式 R6-X-Y- (其中 R6 为苯基或噻吩基,可具有一个或两个选自卤素原子、羟基、一个或两个选自卤素原子的低级取代基、羟基、低级烷基、氰基、低级烷氧基和杂环基,X 和 Y(可以相同或不同)分别是氧原子、硫原子、羰基、式 -CHRa-(其中 Ra 是氢原子或低级烷基)或式 -NRb-(其中 Rb 是氢原子或低级烷基)、或X和Y共同形成乙烯基或乙炔基),条件是当X和Y中的一个是氧原子、硫原子或式-NRb-(其中Rb如上所定义)的基团时,另一个是羰基或式-CHRa-(其中Ra如上所定义)的基团,而W是卤素原子,以及制备此类化合物的工艺。