SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
申请人:ICHIKAWA Koji
公开号:US20120135351A1
公开(公告)日:2012-05-31
The present invention provides a salt represented by the formula (I):
wherein R
1
and R
2
independently each represent a C1-C6 alkyl group or R
1
and R
2
are bonded each other to form a C5-C20 aliphatic ring together with the carbon atom to which they are bonded, R
3
and R
4
independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, X
1
represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH
2
— can be replaced by —O— or —CO— and which may be substituted with one or more fluorine atoms, and Z
1+
represents an organic counter ion.