2-(phenylthiomethyl)cyclohexanone | 51679-32-4

• 分子结构分类: 有机化合物 - 有机硫化合物 - 硫醚类
• 英文名称: 2-(phenylthiomethyl)cyclohexanone
• 英文别名: 2-[(Phenylsulfanyl)methyl]cyclohexanone；2-(phenylsulfanylmethyl)cyclohexan-1-one
• CAS: 51679-32-4
• 化学式: C₁₃H₁₆OS
• 分子量: 220.335
• InChiKey: XJFKNVJZKUHWMB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.46
• 拓扑面积：
  42.4
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  2-(phenylthiomethyl)cyclohexanone 在 sodium periodate 作用下， 以 甲醇 、 水 为溶剂， 以100%的产率得到
  参考文献：
  名称：

  The enantioselective synthesis of tetracyclic methyllycaconitine analogues

  摘要：

  A new enantioselective synthesis of ABEF ring analogues of methyllycaconitine has been developed using a chiral cobalt(III) salen-catalyzed Diels-Alder reaction to form the B ring. Subsequent elaboration to form the A, E and F rings was achieved by sequential Dieckmann, Mannich and Wacker-type cyclizations to afford tetracyclic analogues in 97.5% ee. (C) 2011 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.tet.2011.08.026
• 作为产物：
  描述：

  N,N-二甲基-1-苯基巯基-甲胺 在 盐酸 作用下， 以 乙醇 为溶剂， 反应 0.5h， 生成 2-(phenylthiomethyl)cyclohexanone
  参考文献：
  名称：

  A Novel Method for the α-Phenylthiomethylation of Carbonyl Compounds

  摘要：

  DOI：

  10.1055/s-1981-29424

文献信息

• An episulfonium ion mediated ring expansion of 1-alkenylcycloakanols
  作者：Sunggak Kim、Jung Ho Park

  DOI：10.1016/s0040-4039(01)93336-2

  日期：——

  It has been found that TBDMS ethers of 1-alkenylcycloalkanols are readily rearranged to the ring expanded α-(1-phenylthioalkyl)cycloalkanones in high yields via episulfonium ions.

  已经发现1-烯基环烷醇的TBDMS醚易于通过epi磺酸离子以高收率重排至扩环的α-（1-苯硫烷基）环烷酮。
• Lewis Acid Mediated Selective Chalcogenalkylation of Silyl Enol Ethers with [O,S]-Acetals
  作者：Antonio L. Braga、Luciano Dornelles、Claudio C. Silveira、Ludger A. Wessjohann

  DOI：10.1055/s-1999-3429

  日期：1999.4

  Silyl enol ethers of ketones were selectively alkylated with [O,S]-acetals mediated by Lewis acid in a Mukaiyama type Aldol reaction. The products were β-alkoxy- and /or β-sulfanyl carbonyl compounds depending on the catalyst employed.

  酮的硅缩酮乙醇醚在Mukaiyama型Aldol反应中，通过Lewis酸介导，选择性地与[O,S]-缩醛进行了烷基化。根据所使用的催化剂，产物为β-烷氧基-和/或β-硫烷基羰基化合物。
• α-Sulfenylalkylation of carbonyl compounds at the α-position via magnesium amide-induced enamine sulfenylalkylation with sulfoxides
  作者：Kazuhiro Kobayashi、Masataka Kawakita、Susumu Irisawa、Hideki Akamatsu、Kouji Sakashita、Osamu Morikawa、Hisatoshi Konishi

  DOI：10.1016/s0040-4020(98)83005-6

  日期：1998.3

  The reactions of enamines with sulfoxides bearing α-hydrogens in the presence of a magnesium amide, generated in situ from the reaction of ethylmagnesium bromide with diisopropylamine, afforded the corresponding α-sulfenylalkylated ketones and aldehydes in isolated yields ranging from 39 to 76%. This procedure was successfully extended to the bis(methylthio)methylation with methyl (methylthio)methyl

  烯胺与溴化亚乙基亚乙基溴化镁与二异丙胺的反应在原位生成的酰胺酰胺存在下，烯胺与带有α氢的亚砜的反应以分离的收率在39％至76％范围内提供了相应的α-亚磺酰基烷基化的酮和醛。该方法成功地扩展到用甲基（甲硫基）甲基亚砜进行双（甲硫基）甲基化。
• Novel onium salts, photoacid generators, resist compositions, and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20020076643A1

  公开（公告）日：2002-06-20

  Onium salts of arylsulfonyloxynaphthalenesulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, improved focal latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris after coating, development and peeling, and improved pattern profile after development.

  芳基磺酸氧基萘磺酸盐的离子（离子包括碘离子或亚磺酸盐阳离子）是新颖的。 化学增感抗蚀剂组合物包括该离子盐作为光酸发生剂，适用于微细加工，特别是深紫外光刻，因为具有许多优点，包括提高分辨率，提高焦距范围，即使在长期PED上也能最小化线宽变化或形状退化，涂层、显影和剥离后最小化残留物，并在显影后改善图案轮廓。
• Onium salts, photoacid generators for resist compositions, and patterning process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：EP1077391A1

  公开（公告）日：2001-02-21

  Onium salts of the formula (1) are novel. R1 is C1-10 alkyl or C6-14 aryl, R2 is H or C1-6 alkyl, p is an integer of 1 to 5, q is an integer of 0 to 4, p+q = 5, R3 is C1-10 alkyl or C6-14 aryl, M is a sulfur or iodine atom, and "a" is equal to 3 or 2. A chemical amplification type resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect after coating, development and stripping, and improved pattern profile after development.

  式（1）的铌盐是新颖的。 R1是C1-10烷基或C6-14芳基，R2是H或C1-6烷基，p是1至5的整数，q是0至4的整数，p+q=5，R3是C1-10烷基或C6-14芳基，M是硫或碘原子，"a "等于3或2。由作为光酸发生器的鎓盐组成的化学放大型抗蚀剂组合物适用于微细加工，特别是深紫外光刻，因为它具有许多优点，包括提高了分辨率，即使在长期的 PED 上也能最大限度地减少线宽变化或形状退化，最大限度地减少涂布、显影和剥离后的缺陷，以及改善显影后的图案轮廓。