作者:Kaitlyn A. Perez、Cameron R. Rogers、Emily A. Weiss
DOI:10.1002/anie.202005074
日期:2020.8.10
of aryl sulfonyl‐protected phenols. For a series of aryl sulfonates with electron‐withdrawing substituents, the rate of deprotection for the corresponding phenyl aryl sulfonates increases with decreasing electrochemical potential for the two electron transfers within the catalytic cycle. The rate of deprotection for a substrate that contains a carboxylic acid, a known QD‐binding group, is accelerated
本通讯描述了 CuInS 2的使用/ZnS 量子点 (QD) 作为光催化剂用于芳基磺酰基保护的酚类的还原脱保护。对于一系列具有吸电子取代基的芳基磺酸盐,相应的苯基芳基磺酸盐的脱保护速率随着催化循环内两个电子转移的电化学势的降低而增加。含有羧酸(一种已知的 QD 结合基团)的底物的脱保护速率比转化的电化学电位预期的速率加快了 10 倍以上,这一结果表明亚稳态电子供体的形成-受体复合物提供了显着的动力学优势。这种脱保护方法不会干扰常见的 NHBoc 或甲苯磺酰基保护基团,并且如雌酮底物所证明的那样,