[EN] HALOGEN-CONTAINING ORGANOSULFUR COMPOUNDS AND USE THEREOF FOR CONTROLLING ARTHROPOD PEST<br/>[FR] COMPOSÉS ORGANOSOUFRÉS CONTENANT DE L'HALOGÈNE ET LEUR UTILISATION POUR LUTTER CONTRE LES ARTHROPODES NUISIBLES
申请人:SUMITOMO CHEMICAL CO
公开号:WO2010074327A1
公开(公告)日:2010-07-01
There is provided a halogen-containing organosulfur compound having a controlling effect on arthropod pests represented by the formula (I): wherein m represents 0, 1 or 2; n represents 0, 1 or 2; A represents an optionally substituted 3- to 8-membered saturated heterocyclic group; Q represents a fluorine atom or a C1-C5 haloalkyl group having at least one fluorine atom; R1, R1a and R3 independently represent an optionally halogenated C1-C4 chain hydrocarbon group, etc.; R2, R2a and R4 independently represent an optionally halogenated C1-C4 chain hydrocarbon group, etc.
[EN] HALOGEN-CONTAINING ORGANOSULFUR COMPOUND AND USE THEREOF<br/>[FR] COMPOSÉ ORGANOSULFURIQUE CONTENANT HALOGÈNE ET SON UTILISATION
申请人:SUMITOMO CHEMICAL CO
公开号:WO2009005110A3
公开(公告)日:2009-02-19
WO2007/60839
申请人:——
公开号:——
公开(公告)日:——
ANIMAL ECTOPARASITE CONTROL COMPOSITION
申请人:NISHIGUCHI Naonobu
公开号:US20110160251A1
公开(公告)日:2011-06-30
The present invention provides an animal ectoparasite control composition containing an insecticidal component and an adipate, and a method of controlling an animal ectoparasite which comprises administering an effective amount of the animal ectoparasite control composition to an animal.
PROCESS FOR PRODUCING (FLUOROALKYLTHIO) ACETIC ACID ESTER
申请人:Hirota Masaji
公开号:US20120101294A1
公开(公告)日:2012-04-26
Disclosed is a process for producing a (fluoroalkylthio)acetic acid ester represented by the formula (3) wherein R, R
1
and R
2
have the same meanings as defined below, which comprises reacting a thioglycolic acid ester represented by the formula (1) wherein R represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and R
1
represents an alkyl group having 1 to 4 carbon atoms, with fluoroolefin represented by the formula (2) wherein R
2
represents a fluoroalkyl group having 1 to 5 carbon atoms, in the presence of a radical generator.