作者:Yang Zhou、Vinay Bharadwaj、Mohammad S. Rahman、Paul Sampson、Nicola E. Brasch、Alexander J. Seed
DOI:10.1016/j.jphotochem.2019.112033
日期:2019.11
competing photoinduced O-N bond cleavage to release CF3SO2NH2 as the major photodecomposition pathway. Photolysis of the corresponding -SO2CH3 analogs resulted in O-N bond cleavage only. The presence of the o-nitro substituent was shown to be essential for photoactivity. Photorelease of the parent HNO donor CH3SO2NHOH was observed as the major product upon irradiation of o-NO2Bn-OC(O)ON(H)SO2CH3, with the desired
近来,被光不稳定的保护基封闭的N-羟基磺酰胺(RSO 2 NHOH)作为潜在的光活性硝酰基(HNO)供体引起了极大的兴趣。来自光笼状N-羟基磺酰胺的所需HNO生成途径相对于涉及ON键裂解的竞争途径的选择性取决于光触发剂的特定光脱保护机制。我们提出了一种新型的光笼固N-羟基磺酰胺类,其中包括建立完善的邻硝基苄基光保护基团,包括结合了额外碳酸酯连接基的衍生物。o -NO 2 Bn-ON(H)SO 2 CF的光分解3和相应的2-硝基-4,5-二甲氧基苄基类似物产生所需的HNO和CF 3 SO 2-作为次要途径,竞争的光诱导的ON键裂解释放CF 3 SO 2 NH 2作为主要的光分解途径。相应的-SO 2 CH 3类似物的光解仅导致ON键裂解。已表明邻硝基取代基的存在对于光活性是必不可少的。在辐照邻-NO 2 Bn-OC(O)ON(H)SO时,观察到母体HNO供体CH 3 SO 2 NHOH的光释放为主要产物2