作者:E. Despagnet-Ayoub、W. W. Kramer、W. Sattler、A. Sattler、P. J. LaBeaume、J. W. Thackeray、J. F. Cameron、T. Cardolaccia、A. A. Rachford、J. R. Winkler、H. B. Gray
DOI:10.1039/c7pp00324b
日期:2018.1
The products from the 193 nm irradiation of triphenylsulfonium nonaflate (TPS) embedded in a poly(methyl methacrylate) (PMMA) film have been characterized. The analysis of the photoproduct formation was performed using chromatographic techniques including HPLC, GPC and GC-MS as well as UV-vis and NMR spectroscopic methods. Two previously unreported TPS photoproducts, triphenylene and dibenzothiophene
表征了嵌入在聚甲基丙烯酸甲酯(PMMA)膜中的壬二酸三苯s(TPS)在193 nm照射下的产物。使用色谱技术(包括HPLC,GPC和GC-MS)以及UV-vis和NMR光谱法对光产物形成进行分析。检测到两种以前未报告的TPS光产物三亚苯基和二苯并噻吩;此外,辐照后的GPC和DOSY-NMR光谱分析表明TPS片段已被掺入聚合物薄膜中。在路径长度为1 cm的比色杯中辐照含有10%w / v PMMA和1%w / v TPS的乙腈溶液,仅显示痕量的三亚苯基或二苯并噻吩,表明拓扑化学因素对于这些分子的形成很重要。