申请人:Nissan Chemical Industries, Ltd.
公开号:EP1241527A1
公开(公告)日:2002-09-18
A positive type photosensitive resin composition which can be developed by an aqueous alkaline solution and which is excellent in the developability and the adhesion to a substrate, is presented. Namely, the present invention presents a positive type photosensitive polyimide resin composition characterized by comprising 100 parts by weight of a solvent-soluble polyimide having repeating units represented by the formula (1) and from 1 to 50 parts by weight of a polyimide precursor having repeating units represented by the formula (2), and by further containing an o-quinonediazide compound in an amount of from 1 to 100 parts by weight per 100 parts by weight of the total amount of the repeating units represented by the formula (1) and the repeating units represented by the formula (2):
(wherein R1 and R3 are bivalent organic groups, from 1 to 90 mol% of R1 is a bivalent organic group having one or plural groups of at least one type selected from the group consisting of a phenolic hydroxyl group, a carboxyl group, a thiophenol group and a sulfonic group, and from 10 to 99 mol% is a bivalent organic group having no phenolic hydroxyl, carboxylic, thiophenol or sulfonic group, and R2 and R4 are tetravalent organic groups constituting a tetracarboxylic acid or its derivative).
本发明提出了一种正型感光树脂组合物,它可以用碱性水溶液显影,并且在显影性和对基底的附着力方面都很出色。即,本发明提出了一种正型感光聚酰亚胺树脂组合物,其特征是含有 100 重量份的具有式(1)所代表重复单元的溶剂可溶性聚酰亚胺和 1 至 50 重量份的具有式(2)所代表重复单元的聚酰亚胺前体、并进一步含有邻醌噻嗪化合物,其用量为式(1)代表的重复单元和式(2)代表的重复单元总量的 1 至 100 份(重量比):
(其中 R1 和 R3 为二价有机基团,1-90 摩尔%的 R1 为二价有机基团,该二价有机基团具有一个或多个至少一种类型的基团,该基团选自由酚羟基、羧基、噻吩酚基团和噻吩酚基团组成的组、R2和R4是构成四羧酸或其衍生物的四价有机基团)。