Film forming material and preparation of surface relief and optically anisotropic structures by irradiating a film of the said material
申请人:Fraunhofer-Gesellschaft zur
Förderung der angewandten Forschung e.V.
公开号:EP1632520A1
公开(公告)日:2006-03-08
The present invention relates to a film forming, photoactive material comprising a complex prepared from (a) at least one ionic photosensitive compound which may undergo a photoreaction, selected from photoisomerizations, photocycloadditions and photoinduced rearrangements, wherein the photosensitive compound is of formula I or formula II
[R-P-R']n+ n/x Ax- (I)
or
n/x Ax+ [R-P-R']n- (II)
wherein P is a group capable of photoisomerization, and R and R' are independently selected from optionally substituted or functionalised aryl-containing groups at least one of which is positively or negatively charged, A is an oppositely charged cation or anion, n is an integer, and x is 1, 2 or 3, and/or the photosensitive compound is of formula III or IV:
[R1-Q-R1']n+ n/x Ax- (III)
or
n/x Ax+ [R1-Q-R1']n- (IV)
wherein Q is a group capable of participating in a photocycloaddition or photoinduced rearrangement reaction, and R1 and R1' are independently selected from optionally substituted or functionalized groups having electron-accepting properties and optionally substituted or functionalized aryl-containing groups and from such groups which together with Q form an aryl ring or heteroaryl ring, wherein either at least one of R1 and R1' is positively or negatively charged or the ring structure and/or a substituent thereon will carry at least one positive or negative charge, wherein A, n and x are defined as for formulae I and II, with the proviso that in all compounds of formulae (I) to (IV) contained in one complex, the charge of [R-P-R'] and/or [R1-Q-R1'] has the same sign, and (b) at least one polyelectrolyte carrying charges which are opposite to those of the active groups [R-P-R'] and/or [R1-Q-R1'] of the photosensitive material.
If films prepared from this material are homogeneously or heterogeneously irradiated with polarized light, optical anisotropy and/or a surface relief structure may be reversibly or irreversibly induced in/on the films, depending on specific parameters detailed in the specification.
本发明涉及一种成膜光活性材料,该材料包含由以下物质制备的复合物:(a) 至少一种离子型光敏化合物,该化合物可发生光反应,光反应可选自光异构化、光羰基化和光诱导重排,其中光敏化合物为式 I 或式 II
[R-P-R']n+ n/x Ax- (I)
或
n/x Ax+ [R-P-R']n- (II)
其中 P 是能发生光异构化的基团,R 和 R'分别独立地选自任选取代的或官能化的含芳基的基团(其中至少有一个带正电或负电),A 是带相反电荷的阳离子或阴离子,n 是整数,x 是 1、2 或 3,和/或光敏化合物为式 III 或 IV:
[R1-Q-R1']n+ n/x Ax- (III)
或
n/x Ax+ [R1-Q-R1']n- (IV)
其中 Q 是能够参与光环加成反应或光诱导重排反应的基团,R1 和 R1'独立地选自具有电子接受特性的任选取代或官能化基团、任选取代或官能化的含芳基基团以及与 Q 共同形成芳基环或杂芳环的基团、其中 R1 和 R1'中至少有一个带正电荷或负电荷,或环状结构和/或其取代基至少带一个正电荷或负电荷,其中 A、n 和 x 的定义与式 I 和 II 相同、(b) 至少一种多电解质,其电荷与感光材料的活性基团[R-P-R']和/或[R1-Q-R1']的电荷相反。
如果用偏振光均匀或不均匀地照射这种材料制备的薄膜,根据说明书中详述的具体参 数,可在薄膜内/上可逆或不可逆地诱导出光学各向异性和/或表面浮雕结构。