reaction does not give the polyvinyl ether but results in [1,3] O to C rearrangement to give the corresponding aldehyde, RCH2CHO in moderate to good yields. The rearrangement selectively proceeds when vinyl ethers having α-substituents are used as the starting materials to give the corresponding ketones in high yields. With catalytic amounts of hydrosilanes, the rearrangement gives ketones or aldehydes selectively
Process for production of unsaturated ether and catalyst used for production of unsaturated ether
申请人:NIPPON SHOKUBAI CO., LTD.
公开号:EP0701986A1
公开(公告)日:1996-03-20
A process for producing an unsaturated ether comprises subjecting a glycol ether to intramolecular dehydration in the gas phase in the presence of a catalyst to convert the glycol ether into an unsaturated ether directly in a one-step reaction. As the catalyst, an oxide containing, for example, silicon and an alkali metal is used. The process, which uses no auxiliary raw material, can produce an unsaturated ether (a vinyl ether and/or an allyl ether) simply and safely without generating any waste material derived from the auxiliary raw material.
Method for manufacturing structure having recessed pattern, resin composition, method for forming electroconductive film, electronic circuit, and electronic device
申请人:JSR CORPORATION
公开号:US10392699B2
公开(公告)日:2019-08-27
The present invention relates to: a method of producing a structure having a recessed pattern; a resin composition; a method of forming an electroconductive film; an electronic circuit; and an electronic device. The method of producing a structure having a recessed pattern includes the following steps (i) and (ii), and the recessed pattern has a film thickness that is thinner by 5% to less than 90% with respect to that of a coating film obtained in the step (i):
(i) the step of forming a coating film on a non-flat surface of a structure using a resin composition which includes an acid-dissociable group-containing polymer and an acid generator; and
(ii) the step of forming a recess by subjecting a prescribed part of a portion of the coating film to irradiation with radiation.
本发明涉及:一种生产具有凹陷图案的结构的方法;一种树脂组合物;一种形成导电薄膜的方法;一种电子电路;以及一种电子设备。生产具有凹陷图案的结构的方法包括以下步骤(i)和(ii),凹陷图案的薄膜厚度比步骤(i)中获得的涂膜薄 5%至小于 90%:
(i) 使用树脂组合物在结构的非平面上形成涂膜的步骤,该树脂组合物包括含酸可分解基团的聚合物和酸生成物;以及
(ii) 通过对涂膜部分的规定部分进行辐射形成凹槽的步骤。
Composition for preparing optical functional layer, optical film, and liquid crystal display device
申请人:FUJIFILM Corporation
公开号:US10597478B2
公开(公告)日:2020-03-24
A composition for preparing an optical functional layer capable of forming an optical film having an excellent surface condition and excellent lamination properties with another layer, includes a liquid crystal compound and a copolymer, and the copolymer includes a constitutional unit corresponding to a fluoroaliphatic group-containing monomer represented by Formula I, and a constitutional unit corresponding to a monomer represented by Formula II. In Formulae I and II, R1, R10, and R3 each independently represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, R2 represents an alkyl group having 1 to 20 carbon atoms in which at least one carbon atom has a fluorine atom as a substituent, and L represents a divalent linking group constituted by at least one selected from the group consisting of —O—, —(C═O)O—, —O(C═O)—, a divalent chain group, and a divalent aliphatic cyclic group.
一种用于制备光学功能层的组合物,该光学功能层能够与另一层形成具有优异表面状态和优异层压性能的光学薄膜,该组合物包括液晶化合物和共聚物,共聚物包括与式 I 所代表的含氟脂肪族单体相对应的构型单元,以及与式 II 所代表的单体相对应的构型单元。在式 I 和式 II 中,R1、R10 和 R3 各自独立地代表氢原子或具有 1 至 20 个碳原子的烷基,R2 代表具有 1 至 20 个碳原子的烷基,其中至少一个碳原子具有氟原子作为取代基、L 代表二价连接基团,该基团至少由选自-O-、-(C═O)O-、-O(C═O)-、二价链基和二价脂肪族环基中的一种构成。