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二氟丙二酰氟 | 5930-67-6

中文名称
二氟丙二酰氟
中文别名
——
英文名称
Perfluoro-malonic acid fluoride
英文别名
2,2-difluoromalonyl difluoride;2,2-difluoropropanedioyl difluoride;difluoromalonyl fluoride;perfluoromalonyl difluoride;Difluor-malonsaeure-difluorid;difluoromalonyl difluoride;perfluoromalonyl fluoride;Perfluoro-malonylfluorid;Difluormalonyldifluorid
二氟丙二酰氟化学式
CAS
5930-67-6
化学式
C3F4O2
mdl
MFCD03094111
分子量
144.025
InChiKey
KJOOJFLEZNWPIN-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    -9
  • 密度:
    1.529±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    1.1
  • 重原子数:
    9
  • 可旋转键数:
    2
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.333
  • 拓扑面积:
    34.1
  • 氢给体数:
    0
  • 氢受体数:
    6

安全信息

  • 危险等级:
    TOXIC, CORROSIVE
  • 危险品标志:
    T,C
  • 安全说明:
    S23,S38
  • 危险类别码:
    R23
  • 海关编码:
    2917190090
  • 危险品运输编号:
    UN 3308

SDS

SDS:e7acba6b74a0741c109ace10a8fa3d99
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反应信息

  • 作为反应物:
    描述:
    二氟丙二酰氟 在 fluorine 、 cesium fluoride 作用下, 以70%的产率得到3,3,4,4,5,5-hexafluoro-1,2-dioxolane
    参考文献:
    名称:
    Perfluoro-1,2-dioxolane. A new synthesis and its gas-phase structure
    摘要:
    Highly pure perfluoro-1,2-dioxolane was prepared in good yields by fluorination of 2,2-difluoropropanedioyl difluoride with elemental fluorine in the presence of CsF. A gas-phase electron diffraction study results for the five-membered ring in a half-chair conformation possessing C2 symmetry and the following geometric parameters (r(a) distances and angle(alpha) angles, error limits are 3sigma values and refer to the last digit): O-O = 144.3(11) pm, O-C = 137.7(15) pm, C-C = 153.1(5) pm, (C-F)mean = 131.8(4) pm, CCC = 98.1(13)-degrees, CCO = 107.3(12)-degrees, COO = 102.9(9)-degrees, FCF = 109.8(9)-degrees and the torsional angle around the O-O bond tau(CO-OC) = 48(2)-degrees. Ab initio calculations (HF/4-21G and HF/4-21G*) confirm that this half-chair conformation is the only stable structure along the pseudorotational path and they reproduce the geometric parameters reasonably well.
    DOI:
    10.1016/0022-2860(92)80155-b
  • 作为产物:
    描述:
    参考文献:
    名称:
    Preparation of difluoromalonyl fluoride
    摘要:
    在金属氟化物催化剂或金属氟化物/强磺酸催化剂组合的存在下,羧酸酯和酰氟基团互换位置,产生氟化单-和双酰氟化物。
    公开号:
    US04316986A1
  • 作为试剂:
    参考文献:
    名称:
    Polyfluoroallyloxy compounds, their preparation and copolymers therefrom
    摘要:
    一种多氟卡宾化合物(例如多氟酮或多氟羧酸氟化物)与氟离子和多氟丙烯基氯化物、溴化物或氟硫酸酯的反应会产生多氟丙烯氧化物化合物,例如CF.sub.2.dbd.CFCF.sub.2 OCF.sub.2 CF.sub.2 CN。多氟丙烯氧化物化合物与乙烯基不饱和单体(例如四氟乙烯、氯三氟乙烯或偏氟乙烯)共聚形成可塑性聚合物,在某些情况下具有电导性或可水润湿和染色性。
    公开号:
    US04273728A1
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文献信息

  • Synthesis of perfluorinated vinyl ethers having ester group
    作者:Masaaki Yamabe、Seiji Munekata、Isamu Kaneko、Hiroshi Ukihashi
    DOI:10.1016/s0022-1139(98)00346-7
    日期:1999.2
    A new efficient and convenient synthetic process of perfluorinated vinyl ethers containing an ester group was developed by pyrolysis in the presence of α-trifluoromethyl moiety without loss of –COF functional group followed by alcoholysis in high yield.
    通过在α-三氟甲基部分存在的情况下进行热解,而不会损失–COF官能团,然后醇解,可以高产率地开发出一种新的高效便捷的含酯基全氟乙烯基醚的合成方法。
  • 一种含氟二元酰氟的制备方法
    申请人:中蓝晨光化工研究设计院有限公司
    公开号:CN111333500B
    公开(公告)日:2023-01-03
    本发明公开了一种含氟二元酰氟的制备方法,该制备方法以含氟二元羧酸为原料,在溶剂和催化剂的作用下,与氟化试剂发生氟代反应,得到含氟二元酰氟。实际生产时,含氟二元羧酸在有机溶剂和路易斯酸催化剂的作用下,直接氟化为相应的含氟二元酰氟,采用有机溶剂及特定的催化剂,配合其他条件,能够有效促进含氟二元羧酸高转化率地生成相应的酰氟。
  • Cleaning gasses and etching gases
    申请人:——
    公开号:US20030001134A1
    公开(公告)日:2003-01-02
    The first chamber cleaning gas and the first silicon-containing film-etching gas of the present invention comprise at least one compound selected from the group consisting of FCOF, CF 3 OCOF and CF 3 OCF 2 OCOF, and O 2 in the specific amount, and optionally other gases. The second chamber cleaning gas and the second silicon-containing film-etching gas comprise CF 3 COF, C 3 F 7 COF or CF 2 (COF) 2 and O 2 in specific amounts, and optionally may comprise other gases. The chamber cleaning gases and silicon-containing film etching gases of the present invention have a low global warming potential and hardly generate substances in the exhaust gases such as CF 4 , etc, which are harmful to the environment and have been perceived as contributing to global warming. Therefore, the gases are friendly to the global environment, and have easy handling and excellent exhaust gas treating properties. Further, the chamber cleaning gases of the invention have excellent cleaning rate.
    本发明的第一室清洗气体和第一硅含膜刻蚀气体包括至少选自FCOF、CF3OCOF和CF3OCF2OCOF组合的一种化合物,以及特定量的O2,并可选其他气体。第二室清洗气体和第二硅含膜刻蚀气体包括CF3COF、C3F7COF或CF2(COF)2以及特定量的O2,并且可选其他气体。本发明的清洗气体和硅含膜刻蚀气体具有较低的全球变暖潜力,几乎不会产生对环境有害且被认为是导致全球变暖的气体,如CF4等排放物质。因此,这些气体对全球环境友好,易于处理,具有出色的排放气体处理性能。此外,本发明的清洗气体具有出色的清洗速率。
  • Cleaning gases and etching gases
    申请人:Asahi Glass Company, Limited
    公开号:US06787053B2
    公开(公告)日:2004-09-07
    The first chamber cleaning gas and the first silicon-containing film-etching gas of the present invention comprise at least one compound selected from the group consisting of FCOF, CF3OCOF and CF3OCF2OCOF, and O2 in the specific amount, and optionally other gases. The second chamber cleaning gas and the second silicon-containing film-etching gas comprise CF3COF, C3F7COF or CF2(COF)2 and O2 in specific amounts, and optionally may comprise other gases. The chamber cleaning gases and silicon-containing film etching gases of the present invention have a low global warming potential and hardly generate substances in the exhaust gases such as CF4, etc, which are harmful to the environment and have been perceived as contributing to global warming. Therefore, the gases are friendly to the global environment, and have easy handling and excellent exhaust gas treating properties. Further, the chamber cleaning gases of the invention have excellent cleaning rate.
    本发明的第一室清洗气体和第一硅含膜刻蚀气体包括至少选自FCOF、CF3OCOF和CF3OCF2OCOF群组中的一种化合物,以及特定量的O2,可选其他气体。第二室清洗气体和第二硅含膜刻蚀气体包括CF3COF、C3F7COF或CF2(COF)2和特定量的O2,可选其他气体。本发明的清洗气体和硅含膜刻蚀气体具有低全球变暖潜力,几乎不会产生对环境有害的排放物质,如CF4等,这些物质被认为是导致全球变暖的因素。因此,这些气体对全球环境友好,易于处理,具有优异的排放气体处理性能。此外,本发明的清洗气体具有出色的清洗速率。
  • Kazakov,V.Ya. et al., Journal of general chemistry of the USSR, 1966, vol. 36, p. 1799 - 1802
    作者:Kazakov,V.Ya. et al.
    DOI:——
    日期:——
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表征谱图

  • 氢谱
    1HNMR
  • 质谱
    MS
  • 碳谱
    13CNMR
  • 红外
    IR
  • 拉曼
    Raman
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  • 峰位数据
  • 峰位匹配
  • 表征信息
Shift(ppm)
Intensity
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Assign
Shift(ppm)
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测试频率
样品用量
溶剂
溶剂用量
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