A positive photoresist composition comprising:
(A) an oxime sulfonate compound represented by the specific formula,
(B) a resin comprising repeating units including a group represented by the specific formula and which increases the solubility in an alkaline developing solution by the action of an acid, and
(C) a fluoroaliphatic-group-containing polymeric compound containing repeating units derived from a monomer represented by the specific formula.
一种正向光刻胶组合物,包括:(A)一种由特定公式表示的
肟磺酸盐化合物,(B)一种
树脂,包括重复单元,其中包括由特定公式表示并通过酸的作用增加在碱性显影溶液中的溶解度的基团,和(C)一种含有含氟烷基的聚合物化合物,其中包含由特定公式表示的单体衍生的重复单元。