Moreau; Parry; Michelot, European Journal of Medicinal Chemistry, 1986, vol. 21, # 5, p. 423 - 431
作者:Moreau、Parry、Michelot、et al.
DOI:——
日期:——
MOREAU M. -F.; PARRY D.; MICHELOT J.; LABARRE P.; MADELMONT J. -C.; VEYRE+, EUR. J. MED. CHEM., 21,(1986) N 5, 423-431
作者:MOREAU M. -F.、 PARRY D.、 MICHELOT J.、 LABARRE P.、 MADELMONT J. -C.、 VEYRE+
DOI:——
日期:——
RESIST COMPOSITION AND PATTERNING PROCESS
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20200050105A1
公开(公告)日:2020-02-13
A resist composition comprising a base polymer and a quencher in the form of an amine compound having an iodized aromatic ring bonded to the nitrogen atom via a divalent hydrocarbon group offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.