Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound
申请人:JSR Corporation
公开号:EP2781959A2
公开(公告)日:2014-09-24
A radiation-sensitive resin composition includes (A) a polymer that includes an acid-labile group, (B) an acid generator that generates an acid upon exposure to radiation, and (C) a polymer that includes a fluorine atom and a functional group shown by the following general formula (x), the polymer (C) having a fluorine atom content higher than that of the polymer (A).
— A—R1 (x)
wherein R1 represents an alkali-labile group, and A represents an oxygen atom (excluding an oxygen atom that is bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group), an imino group, -CO-O-*, or -SO2-O-* (wherein "*" indicates a bonding hand bonded to R1).
一种辐射敏感树脂组合物包括:(A) 含有酸亲和基的聚合物;(B) 在辐射照射下产生酸的酸发生器;(C) 含有氟原子和以下通式 (x) 所示官能团的聚合物,聚合物 (C) 的氟原子含量高于聚合物 (A)。
- A-R1 (x)
其中 R1 代表耐碱基团,A 代表氧原子(不包括直接与芳香环、羰基或亚磺酰基键合的氧原子)、亚氨基、-CO-O-* 或 -SO2-O-* (其中 "*"表示与 R1 键合的键手)。