申请人:Mizuno Takahiro
公开号:US10144849B2
公开(公告)日:2018-12-04
A polishing composition contains a nitrogen-containing compound and abrasive grains, and the pH of the composition is in the range of 1 to 7. The nitrogen-containing compound in the polishing composition preferably has a structure expressed by a formula: R1—N(—R2)—R3 in which R1, R2, and R3 each represent an alkyl group with or without a characteristic group, two of R1 to R3 may form a part of a heterocycle, and two of R1 to R3 may be identical and form a part of a heterocycle with the remaining one. Alternatively, the nitrogen-containing compound is preferably selected from a group consisting of a carboxybetaine type ampholytic surfactant, a sulfobetaine type ampholytic surfactant, an imidazoline type ampholytic surfactant, and an amine oxide type ampholytic surfactant. A polishing composition may contain a water-soluble polymer and abrasive grains, and the pH of the composition is in the range of 1 to 8.
一种抛光组合物含有一种含氮化合物和磨粒,组合物的 pH 值在 1 至 7 之间。抛光组合物中的含氮化合物最好具有由式表示的结构:R1-N(-R2)-R3,其中 R1、R2 和 R3 各代表一个带或不带特征基团的烷基,R1 至 R3 中的两个可构成杂环的一部分,R1 至 R3 中的两个可相同并与其余一个构成杂环的一部分。另外,含氮化合物最好选自羧基甜菜碱型两性表面活性剂、磺基甜菜碱型两性表面活性剂、咪唑啉型两性表面活性剂和氧化胺型两性表面活性剂组成的组。抛光组合物可包含水溶性聚合物和磨粒,组合物的 pH 值范围为 1 至 8。