Triphenylsulfanium dodecanoate | 564483-94-9

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: Triphenylsulfanium dodecanoate
• 英文别名: dodecanoate;triphenylsulfanium
• CAS: 564483-94-9
• 化学式: C30H38O2S
• 分子量: 462.7
• InChiKey: WVDRMKCZSAXMMM-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  7.44
• 重原子数：
  33
• 可旋转键数：
  12
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.37
• 拓扑面积：
  41.1
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• Novel photosensitive bilayer composition
  申请人：Foster Patrick

  公开号：US20050042542A1

  公开（公告）日：2005-02-24

  Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure I where R 1 is a moiety containing an ethylenically unsaturated polymerizable group, R 2 is a C 1 -C 3 alkylene group, and R 3 is a C 1-10 linear or cyclic alkyl group, a C 6-10 aromatic or substituted aromatic group, a C 1-8 alkoxy methyl, or a C 1-8 alkoxy ethyl group, are useful as binder resins for photosensitive compositions, and processes for photolithography in the production of semiconductor devices and materials.

  具有由结构I单体聚合形成的单体单元的高分子和共聚物，其中R1是含有乙烯基不饱和可聚合基团的基团，R2是C1-C3烷基基团，R3是C1-10线性或环烷基团，C6-10芳香或取代芳香基团，C1-8烷氧甲基或C1-8烷氧乙基基团，可用作感光组合物的粘合剂树脂，以及在半导体器件和材料的制造中用于光刻工艺的过程。
• Acetal protected polymers and photoresists compositions thereof
  申请人：ARCH SPECIALITY CHEMICALS, INC.

  公开号：US20040034160A1

  公开（公告）日：2004-02-19

  A polymer comprises an acetal-containing monomer unit having the general structure I and at least one of the fluorine-containing monomer units having the general structures II and III: 1 wherein R 1 , R 4 , R 5 and R 6 are each independently H, lower alkyl, CH 2 CO 2 R 10 , cyano, CH 2 CN, or halogen, wherein R 10 is any alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl or siloxy or linear or cyclic polysiloxane group; R 2 is CHR 11 R 12 where R 11 and R 12 are each independently H, lower alkyl, cycloalkyl or aryl; A is a substituted or unsubstituted alkylene, cycloalkylene, alkylenecycloalkylene, or alkylenearylene; and R 3 is linear, branched or cyclic fluoroalkyl group or SiR 13 R 14 R 15 where R 13 , R 14 , and R 15 are each independently alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl, siloxy, linear or cyclic polysiloxane or silsesquioxane alkyl group; B is an aryl, C(═O)—O—(CH 2 ) x where x= 0−4 , lower alkyl, cycloalkyl, alkene cycloalkyl, silyl, siloxyl, or linear or cyclic polysiloxane group. R 7 is H or an acid sensitive group; R 8 and R 9 are each independently H or —CN group; and y=0−4 and the use of these polymers in radiation sensitive compositions for exposure to actinic radiation, especially radiation of 157 nm.

  一种聚合物包括具有一般结构 I 的含缩醛单体单元和至少一种具有一般结构 II 和 III 的含氟单体单元： 1 其中 R 1 , R 4 , R 5 和 R 6 各自独立地为 H、低级烷基、CH 2 CO 2 R 10 氰基，CH 2 CN 或卤素，其中 R 10 是任何烷基、环烷基、芳基、芳烷基、亚烷基环烷基、硅烷基或硅氧基或线性或环状聚硅氧烷基团；R 2 是 CHR 11 R 12 其中 R 11 和 R 12 各自独立地为 H、低级烷基、环烷基或芳基； A 为取代或未取代的亚烷基、环烷基、亚烷基环烷基或亚烷基芳基；以及 R 3 是直链、支链或环状氟烷基或 SiR 13 R 14 R 15 其中 R 13 , R 14 和 R 15 各自独立地为烷基、环烷基、芳基、芳烷基、亚烷基环烷基、硅烷基、硅氧基、线性或环状聚硅氧烷或硅烷基烷基；B 为芳基、C(═O)-O-(CH) 2 ) x 其中 x 等于 0-4 、低级烷基、环烷基、烯环烷基、硅烷基、硅氧基或线性或环状聚硅氧烷基团。R 7 是 H 或酸敏感基团 8 和 R 9 y=0-4 以及这些聚合物在辐射敏感性组合物中的使用，用于暴露于辐射，特别是 157 纳米的辐射。
• ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF
  申请人：Arch Specialty Chemicals, Inc.

  公开号：EP1509814A2

  公开（公告）日：2005-03-02
• EP1509814A4
  申请人：——

  公开号：EP1509814A4

  公开（公告）日：2008-08-27
• NOVEL PHOTOSENSITIVE BILAYER COMPOSITION
  申请人：FujiFilm Electronic Materials USA, Inc.

  公开号：EP1656590A2

  公开（公告）日：2006-05-17