Water-processable positive-tone photoresists comprising a water-soluble polymer, wherein the polymer contains a heat-labile functional group that renders the polymer insoluble in water or an aqueous base upon heat treatment, and an acid-labile functional group that restores said water or aqueous base solubility to the polymer upon irradiation in the presence of a water-processable photoacid generator, are described. Also described are the methods of making such polymers and photoresists.
本文描述了一种
水可处理的正向光刻胶,包括一种
水溶性聚合物,其中该聚合物含有一种热敏功能基团,该功能基团在热处理时使聚合物在
水或
水性碱性溶液中不溶,以及一种酸敏功能基团,该功能基团在存在
水可处理的光酸发生剂的情况下,在辐射作用下恢复聚合物的
水或
水性碱性溶解性。同时,还描述了制备这种聚合物和光刻胶的方法。