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4-hydroxy-3,3-bis-hydroxymethyl-butyric acid | 98584-79-3

中文名称
——
中文别名
——
英文名称
4-hydroxy-3,3-bis-hydroxymethyl-butyric acid
英文别名
4-Hydroxy-3,3-bis-hydroxymethyl-buttersaeure;3,3-bis(hydroxymethyl)-4-hydroxybutanoic acid;4-Hydroxy-3,3-bis(hydroxymethyl)butanoic acid
4-hydroxy-3,3-bis-hydroxymethyl-butyric acid化学式
CAS
98584-79-3
化学式
C6H12O5
mdl
——
分子量
164.158
InChiKey
QNGGJBVWSMKPMX-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    -2.2
  • 重原子数:
    11
  • 可旋转键数:
    5
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.83
  • 拓扑面积:
    98
  • 氢给体数:
    4
  • 氢受体数:
    5

反应信息

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文献信息

  • Fluorinated crosslinker and composition
    申请人:——
    公开号:US20020111518A1
    公开(公告)日:2002-08-15
    Fluorinated multifunctional alcohols containing at least 3 primary hydroxyl groups are disclosed. Such alcohols allow for easy synthesis of multifunctional crosslinkers such as acrylates, epoxies and vinyl ethers. The multifunctional crosslinkers are used in fluorinated optical coating and waveguide compositions to increase curing speed and crosslinking density.
    揭示了含有至少3个主要羟基的氟化多功能醇。这些醇可用于易于合成多功能交联剂,如丙烯酸酯、环氧树脂和乙烯醚。多功能交联剂用于氟化光学涂层和波导组合物中,以增加固化速度和交联密度。
  • CASHEW NUT SHELL LIQUID DERIVATIVES AND METHODS FOR MAKING AND USING SAME
    申请人:Cardolite Corporation
    公开号:US20210340315A1
    公开(公告)日:2021-11-04
    The present invention is directed to Cashew Nut Shell Liquid derivatives and methods for making and using same. The invention is also directed to Cashew Nut Shell Liquid based monomers and polymers for making antimicrobials, antioxidants, adhesives, coatings, corrosion retardants composites, cosmetics, detergents, soaps, de-icing products, elastomers, food, flavors, inks, lubricants, oil field chemicals, personal care products, polymers, structural polymers, engineered plastics, 3D printable polymers, techno-polymers, rubbers, sealants, solvents, surfactants and varnishes.
    本发明涉及腰果壳液的衍生物及其制备和使用方法。本发明还涉及基于腰果壳液的单体和聚合物,用于制备抗微生物、抗氧化剂、粘合剂、涂料、防腐剂复合材料、化妆品、清洁剂、肥皂、除冰产品、弹性体、食品、香料、油墨、润滑剂、油田化学品、个人护理产品、聚合物、结构聚合物、工程塑料、3D可打印聚合物、技术聚合物、橡胶、密封剂、溶剂、表面活性剂和清漆。
  • Adjustable low gloss powder coating compositions
    申请人:Stepan Company
    公开号:US10450479B2
    公开(公告)日:2019-10-22
    Thermosetting powdered coating compositions comprising (a) a high Acid Value carboxylic acid functional polyester resin having an Acid Value of at least 100 mg KOH/g and a functionality of at least 4.5, (b) a low Acid Value carboxylic acid functional polyester resin having an Acid Value of 20 to 50 mg KOH/g and a functionality of about 2.5 or less, and (c) a cross-linking agent. The high Acid Value polyester resin is the reaction product of a polycarboxylic acid or its anhydride reacted with a polyester polyol obtained from reacting 0 mol % to 100 mol % of isophthalic acid and/or 0 to 100 mol % terephthalic acid, or a mixture thereof, with a polyol mixture comprising at least one diol and at least one polyol having at least three hydroxyl groups. The thermosetting powdered coating compositions provide coatings with low gloss levels that can be adjusted from a gloss level of less than 1 to 40 or less, when measured at an angle of 60°, by varying the ratios of the high Acid Value and low Acid Value polyester resins in the composition.
    热固性粉末涂料组合物,包括(a)高酸值羧酸功能聚酯树脂,其酸值至少为 100 毫克 KOH/g,官能度至少为 4.5;(b)低酸值羧酸功能聚酯树脂,其酸值为 20 至 50 毫克 KOH/g,官能度约为 2.5 或更低;(c)交联剂。高酸值聚酯树脂是聚羧酸或其酸酐与聚酯多元醇反应的反应产物,聚酯多元醇由 0 至 100 摩尔%的间苯二甲酸和/或 0 至 100 摩尔%的对苯二甲酸或其混合物与多元醇混合物反应而得,多元醇混合物包括至少一种二元醇和至少一种具有至少三个羟基的多元醇。热固性粉末涂料组合物可提供低光泽度的涂料,通过改变组合物中高酸值和低酸值聚酯树脂的比例,在 60° 角测量时,光泽度可从小于 1 调整到 40 或更低。
  • Post-etch residue removal for advanced node beol processing
    申请人:Entegris, Inc.
    公开号:US10790187B2
    公开(公告)日:2020-09-29
    The disclosure relates to a cleaning composition that aids in the removal of post-etch residues and aluminum-containing material, e.g., aluminum oxide, in the production of semiconductors that utilize an aluminum-containing etch stop layer. The compositions have a high selectivity for post-etch residue and aluminum-containing materials relative to low-k dielectric materials, cobalt-containing materials and other metals on the microelectronic device.
    本公开涉及一种清洁组合物,有助于在生产使用含铝蚀刻终止层的半导体时去除蚀刻后残留物和含铝材料(如氧化铝)。相对于微电子设备上的低介电材料、含钴材料和其他金属,该组合物对蚀刻后残留物和含铝材料具有高选择性。
  • Post CMP cleaning compositions for ceria particles
    申请人:ENTEGRIS, INC.
    公开号:US11085011B2
    公开(公告)日:2021-08-10
    The invention provides a removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and ceria particles from a microelectronic device having said particles and contaminants thereon. The composition achieves highly efficacious removal of the ceria particles and CMP by-product contaminant material from the surface of the microelectronic device.
    本发明提供了一种清除化学机械抛光(CMP)后污染物和铈微粒的组合物和工艺。该组合物能高效去除微电子设备表面的铈颗粒和 CMP 副产品污染物。
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