COATING COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY PROCESS
申请人:ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
公开号:US20200133126A1
公开(公告)日:2020-04-30
A monomer represented by Chemical Formula (1):
wherein, X, Y, and Z are the same as described in the specification, and the polymer including repeat units derived from the monomer.