A resist composition for immersion exposure, including a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing compound (C) represented by a general formula (c-1) shown below that is decomposable in an alkali developing solution:
wherein R1 represents an organic group which may contain a polymerizable group, with the proviso that said polymerizable group has a carbon-carbon multiple bond, and the carbon atoms forming the multiple bond are not directly bonded to the carbon atom within the -C(=O)- group in general formula (c-1); and R2 represents an organic group having a fluorine atom.
一种用于浸泡曝光的抗蚀剂组合物,包括在酸的作用下在碱显影液中的溶解度发生变化的碱成分(A)、在曝光时产生酸的酸生成成分(B)、以及可在碱显影液中分解的由下图所示通式(c-1)表示的含
氟化合物(C):
其中 R1 代表可含有可聚合基团的有机基团,但条件是所述可聚合基团具有碳-碳多键,且形成多键的碳原子与通式(c-1)中 -C(=O)- 基团内的碳原子不直接成键;R2 代表具有
氟原子的有机基团。