ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION
申请人:INASAKI Takeshi
公开号:US20130029255A1
公开(公告)日:2013-01-31
Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) which contains at least one phenolic hydroxyl group and at least one group where a hydrogen atom in a phenolic hydroxyl group is substituted by a group represented by the following General Formula (1).
(in the formula, each of R
11
and R
12
independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group; X
11
represents an aryl group; M
11
represents a single bond or a divalent linking group; and Q
11
represents an alkyl group, a cycloalkyl group or an aryl group, wherein the number of carbon atoms which are included in the group represented by -M
11
-Q
11
is 3 or more, and at least two of R
11
, R
12
, Q
11
, and X
11
may form a ring by bonding to each other)
提供的是一种感光树脂组合物,其中包含至少含有一个酚羟基和至少一个氢原子被以下通式(1)所代表的基替换的基团的化合物(A)。(在通式中,R11和R12分别独立地表示氢原子、烷基、环烷基、芳基或芳基烷基;X11表示芳基;M11表示单键或二价连接基团;Q11表示烷基、环烷基或芳基,其中包含在-M11-Q11所代表的基团中的碳原子数为3或更多,并且R11、R12、Q11和X11中至少有两个可以通过相互键合形成环)