2,6-bis[(2,4,6-trihydroxyphenyl)methyl]-4-methylphenol

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 英文名称: 2,6-bis[(2,4,6-trihydroxyphenyl)methyl]-4-methylphenol
• 英文别名: (2-Hydroxy-5-methyl-1,3-phenylene)bis(methylene) dibenzene-1,3,5-triol；2-[[2-hydroxy-5-methyl-3-[(2,4,6-trihydroxyphenyl)methyl]phenyl]methyl]benzene-1,3,5-triol
• 化学式: C₂₁H₂₀O₇
• 分子量: 384.386
• InChiKey: OBWYKDNPBNLGON-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  28
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  142
• 氢给体数：
  7
• 氢受体数：
  7

反应信息

• 作为产物：
  描述：

  2-羟基-5-甲基间苯二甲醇 、 对甲苯磺酸一水合物 、 phloroglucinol dihydrate 以 水 为溶剂， 生成 2,6-bis[(2,4,6-trihydroxyphenyl)methyl]-4-methylphenol
  参考文献：
  名称：

  Selected trinuclear novolak oligomers and their use in photoactive

  摘要：

  一种三核新戊酚寡聚物，其化学式为（I）：##STR1## 其中每个X选择自羟基和卤素基组成的群体，Y选择自具有1-4个碳原子的低碳链烷基和卤素原子组成的群体。

  公开号：

  US04992596A1

文献信息

• Positive type photoresist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0445680A2

  公开（公告）日：1991-09-11

  A positive type photoresist composition which is superior in the prevention of pattern break and scumming during development, comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein said novolak resin is a condensate of a mixture of m-cresol and p-cresol with at least one of formaldehyde, formaldehyde polymer and formaldehyde precursor and wherein the relationship between X = A/(A+B+C) and the content of m-cresol in said novolak resin falls within the shaded part (including the straight lines surrounding this part) in Figure 1, said A representing an integrated value of peak area between 23.0 ppm and 31.0 ppm , B representing an integrated value of peak area between 31.0 ppm and 34.0 ppm and C representing an integrated value of peak area between 34.0 ppm and 37.0 ppm in a ¹³C-NMR spectrum of a dimethyl sulfoxide-d₆ solution of said novolak resin.

  一种正型光刻胶组合物，在显影过程中可有效防止图案破裂和浮渣，该组合物由碱溶性酚醛树脂和 1,2-醌噻嗪化合物组成，其中所述酚醛树脂是间甲酚和对甲酚与甲醛、甲醛聚合物和甲醛前体中至少一种的混合物的缩合物、其中，X = A/(A+B+C) 与间甲酚在所述酚醛树脂中的含量之间的关系在图 1 中的阴影部分（包括围绕该部分的直线）内，所述 A 代表峰面积的综合值，介于 23.在所述酚醛树脂的二甲亚砜-d₆溶液的¹³C-NMR 光谱中，A 代表峰面积的综合值在 23.0 ppm 和 31.0 ppm 之间，B 代表峰面积的综合值在 31.0 ppm 和 34.0 ppm 之间，C 代表峰面积的综合值在 34.0 ppm 和 37.0 ppm 之间。
• Process for synthesizing quinonediazide ester and positive working photoresist containing the same
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0706089A2

  公开（公告）日：1996-04-10

  A process for synthesizing a quinonediazide ester is disclosed in which the esterification reaction of a polyhydroxy compound with 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonyl chloride is carried out in the presence of a base catalyst comprising a basic compound represented by formula (I) or (II): wherein R₁ to R₁₅ are defined in the disclosure. A positive working photoresist containing the ester is also disclosed. The process is capable of highly selectively yielding the desired photosensitive material containing specific unreacted hydroxyl group(s). The photoresist has high resolving power with reduced film thickness dependence of the resolving power, is less apt to leave a development residue, and has excellent storage stability for prolonged period of time.

  本发明公开了一种合成喹酮噻嗪酯的工艺，在该工艺中，多羟基化合物与 1,2-萘醌噻嗪-5-（和/或-4-）磺酰氯的酯化反应是在碱催化剂存在下进行的，碱催化剂包括由式 (I) 或 (II) 所代表的碱化合物： 其中 R₁至 R₁₅的定义见公开内容。此外，还公开了一种含有该酯的正工作光刻胶。该工艺能够高选择性地得到所需的光敏材料，其中含有特定的未反应羟基。这种光刻胶具有很高的分辨力，同时降低了膜厚度对分辨力的依赖性，不易留下显影残留物，并且在长时间储存时具有极佳的稳定性。
• Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0745575A1

  公开（公告）日：1996-12-04

  Provided are a method of synthesizing a highly pure polyphenol compound, which comprises (i) introducing at least one -CHRNR'R'' group onto aromatic ring(s) of a phenol compound having from one to ten aromatic ring(s), wherein R represents a hydrogen atom, an alkyl group which may contain a hetero atom, a cycloalkyl group which may contain a hetero atom, an aralkyl group which may contain a hetero atom, or an aryl group, and R' and R'', which may be the same or different, each represents an alkyl group which may contain a hetero atom, a cycloalkyl group which may contain a hetero atom, an aralkyl group which may contain a hetero atom, or an aryl group, and R' and R'' may combine with each other to form a ring, (ii) converting the -CHRNR'R'' group into a -CHRA group via one to three steps, wherein A represents a hydroxyl group, an alkoxy group, an acyloxy group, a halogen atom, a quaternary ammonium salt or a sulfonyloxy group, and (iii) condensing the thus converted phenol compound and a phenol compound, and a positive working photoresist composition using the polyphenol compound obtained by the aforementioned method.

  本发明提供了一种合成高纯度多酚化合物的方法，该方法包括(i)在具有一至十个芳香环的苯酚化合物的芳香环上引入至少一个-CHRNR'R''基团，其中 R 代表氢原子、可含有杂原子的烷基、可含有杂原子的环烷基、可含有杂原子的芳烷基或芳基、可含有杂原子的环烷基、可含有杂原子的芳烷基或芳基，R'和 R''可以相同或不同，各自代表可含有杂原子的烷基、可含有杂原子的环烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、(ii) 通过一至三个步骤将 -CHRNR'R'' 基团转化为 -CHRA 基团，其中 A 代表羟基、烷氧基、酰氧基、环烷基或芳基、烷氧基、酰氧基、卤素原子、季铵盐或磺酰氧基，以及 (iii) 将由此转化的苯酚化合物和苯酚化合物缩合，并使用通过上述方法获得的多酚化合物制备正性工作光刻胶组合物。
• THERMALLY CONDUCTIVE MATERIAL-FORMING COMPOSITION, THERMALLY CONDUCTIVE MATERIAL, THERMALLY CONDUCTIVE SHEET, DEVICE WITH THERMALLY CONDUCTIVE LAYER, AND FILM
  申请人：FUJIFILM Corporation

  公开号：US20210284788A1

  公开（公告）日：2021-09-16

  The present invention provides a thermally conductive material-forming composition from which a thermally conductive material having excellent thermally conductive properties can be obtained. Moreover, a thermally conductive material formed of the thermally conductive material-forming composition, a thermally conductive sheet, and a device with a thermally conductive layer are provided. Further, the present invention provides a film from which a thermally conductive sheet having excellent thermally conductive properties can be prepared. Furthermore, a thermally conductive sheet prepared using the film, and a device with a thermally conductive layer are provided. The thermally conductive material-forming composition according to the embodiment of the present invention is a thermally conductive material-forming composition including an epoxy compound, one or more kinds of phenolic compounds selected from the group consisting of a compound represented by General Formula (1) and a compound represented by General Formula (2), and an inorganic substance, or the like.
• COMPOSITION FOR FORMING THERMALLY CONDUCTIVE MATERIAL, AND THERMALLY CONDUCTIVE MATERIAL
  申请人：FUJIFILM Corporation

  公开号：US20210355364A1

  公开（公告）日：2021-11-18

  A composition for forming a thermally conductive material contains a compound represented by General Formula (1), a phenolic compound, and an inorganic substance, in which a content of the compound represented by General Formula (1) is 30.0% by mass or greater with respect to a total organic solid content, (X—Z 1 —) m -A-(—Z 2 —Y) n (1).