4-amino-N-(4-hydroxy-5-methylisoxazol-3-yl)benzenesulfonamide

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-amino-N-(4-hydroxy-5-methylisoxazol-3-yl)benzenesulfonamide
• 英文别名: 4-amino-N-(4-hydroxy-5-methyl-1,2-oxazol-3-yl)benzenesulfonamide
• 化学式: C₁₀H₁₁N₃O₄S
• 分子量: 269.281
• InChiKey: QUSGNLNZLWWFAH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.07
• 重原子数：
  18.0
• 可旋转键数：
  3.0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  118.45
• 氢给体数：
  3.0
• 氢受体数：
  6.0

反应信息

• 作为产物：
  描述：

  磺胺甲恶唑 在 AgBr-BaMoO₄ composite photocatalyst 作用下， 以 水 为溶剂， 反应 1.25h， 生成 3-氨基-5-甲基异恶唑 、 苯磺酰胺 、 1,2,4-苯三酚 、 磺胺脲 、 3-羟基苯磺酰胺 、 4-amino-N-(4-hydroxy-5-methylisoxazol-3-yl)benzenesulfonamide 、 N-(4,5-dihydroxy-5-methyl-4,5-dihydroisoxazol-3-yl)-4-hydroxybenzenesulfonamide 、 N-(4,5-dihydroxy-5-methyl-4,5-dihydroisoxazol-3-yl)benzenesulfonamide 、 (Z)-N-((2-oxopropylidene)carbamoyl)methanesulfonamide 、 3,4-dihydroxy-N-(5-methylisoxazol-3-yl)benzenesulfonamide 、 3,4-dihydroxy-N-(4-hydroxy-5-methylisoxazol-3-yl)benzenesulfonamide 、 4-amino-3-hydroxy-N- (5-methylisoxazol-3-yl)benzenesulfonamide 、 4-amino-3-hydroxy-N-(4-hydroxy-5-methylisoxazol-3-yl)benzenesulfonamide 、 2-oxo-N-(phenylsulfonyl)acetimidamide 、 4-羟基-N-(5-甲基-1,2-恶唑-3-基)苯磺酰胺 、 4-硝基磺胺甲恶唑 、 苯酚
  参考文献：
  名称：

  Insight into sulfamethoxazole degradation, mechanism, and pathways by AgBr-BaMoO4 composite photocatalyst

  摘要：

  A composite photocatalyst, AgBr-BaMoO4 was fabricated by two step method; microwave hydrothermal and precipitation-deposition. The as prepared photocatalyst samples were characterized by various techniques. The facet coupling was seen between the (204) plane of BaMoO4 and (200)/(222) planes of AgBr on the basis of XRD/HRTEM analysis. The pharmaceutical pollutant, sulfamethoxazole was adopted to investigate the photo catalytic performances of samples under UV-vis irradiation. The AgBr-BaMoO4 composite degraded the aqueous sulfamethoxazole drug in UV-vis light about 64% within 75 min, which was attributed to efficient separation of photogenerated electron-hole pairs across the interface between Ag/AgBr and BaMoO4. The multi-electron induced oxygen reduced reaction (ORR) was observed. The radical trapping experiment indicates that OH center dot has major role for sulfamethoxazole degradation. The four successive photodegradation of sulfamethoxazole in UV-vis light indicates the stability of composite photocatalyst. Furthermore, the three different degradation pathways were designed on the basis of retention time and molecular masses of 18 degraded organic fragments that was confirmed by high-performance liquid chromatography photodiode array (HPLC-PDA) and high resolution-quadruple time of flight electrospray ionization mass spectroscopy (HR-QTOF ESI/MS) techniques. The total organic carbon (TOC) analysis suggested the mineralization of SMZ by composite photocatalyst. This study not only demonstrates the enhancement of photocatalytic performance of wide band gap semiconductor by making composite with narrow band gap semiconductor but also detail degradation pathways and mechanisms of sulfamethoxazole.

  DOI：

  10.1016/j.jphotochem.2018.07.007

文献信息

• Insight into sulfamethoxazole degradation, mechanism, and pathways by AgBr-BaMoO4 composite photocatalyst
  作者：Schindra Kumar Ray、Dipesh Dhakal、Soo Wohn Lee

  DOI：10.1016/j.jphotochem.2018.07.007

  日期：2018.9

  A composite photocatalyst, AgBr-BaMoO4 was fabricated by two step method; microwave hydrothermal and precipitation-deposition. The as prepared photocatalyst samples were characterized by various techniques. The facet coupling was seen between the (204) plane of BaMoO4 and (200)/(222) planes of AgBr on the basis of XRD/HRTEM analysis. The pharmaceutical pollutant, sulfamethoxazole was adopted to investigate the photo catalytic performances of samples under UV-vis irradiation. The AgBr-BaMoO4 composite degraded the aqueous sulfamethoxazole drug in UV-vis light about 64% within 75 min, which was attributed to efficient separation of photogenerated electron-hole pairs across the interface between Ag/AgBr and BaMoO4. The multi-electron induced oxygen reduced reaction (ORR) was observed. The radical trapping experiment indicates that OH center dot has major role for sulfamethoxazole degradation. The four successive photodegradation of sulfamethoxazole in UV-vis light indicates the stability of composite photocatalyst. Furthermore, the three different degradation pathways were designed on the basis of retention time and molecular masses of 18 degraded organic fragments that was confirmed by high-performance liquid chromatography photodiode array (HPLC-PDA) and high resolution-quadruple time of flight electrospray ionization mass spectroscopy (HR-QTOF ESI/MS) techniques. The total organic carbon (TOC) analysis suggested the mineralization of SMZ by composite photocatalyst. This study not only demonstrates the enhancement of photocatalytic performance of wide band gap semiconductor by making composite with narrow band gap semiconductor but also detail degradation pathways and mechanisms of sulfamethoxazole.