1,3-Di[2-(2-hydroxy-5-methylphenyl)-2-propyl]-benzene

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 英文名称: 1,3-Di[2-(2-hydroxy-5-methylphenyl)-2-propyl]-benzene
• 英文别名: 1,3-bis[2-(2-hydroxy-5-methylphenyl)-2-propyl]benzene；2-[2-[3-[2-(2-Hydroxy-5-methylphenyl)propan-2-yl]phenyl]propan-2-yl]-4-methylphenol
• 化学式: C₂₆H₃₀O₂
• 分子量: 374.523
• InChiKey: JCYJROSQXNCFAE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.5
• 重原子数：
  28
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.31
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  对甲酚 、 1,3-二异丙烯基苯 、 aluminium hydride 以 正庚烷 、 丙酮 为溶剂， 以80%的产率得到1,3-Di[2-(2-hydroxy-5-methylphenyl)-2-propyl]-benzene
  参考文献：
  名称：

  Bis-benzotriazolyl compounds and polymeric materials stabilized therewith

  摘要：

  公开号：

  EP0366572B1

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• Method for the production of phenolic compounds and resins
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：EP0126625A2

  公开（公告）日：1984-11-28

  A phenolic product is prepared by reacting (a) a phenol compound of the formula wherein R1 is H, -OH, C1-8 alkyl or alkenyl, or a group and R2 is H or C1-8 alkyl or alkenyl with (b) a compound of the formula wherein R3 and R4 each is - ; R3 and R4 may be the same or different, in the presence of an acidic catalyst. The resulting reaction product is reacted with an aldehyde compound, e.g. HCHO, in the presence of an acidic catalyst or a basic catalyst, to produce a phenolic resin which is moldable, highly flexible and heat-resistant.

  酚醛产品的制备方法是：(a) 式中 R1 为 H、-OH、C1-8 烷基或烯基或一个基团的苯酚化合物，R2 为 H 或 C1-8 烷基或烯基的苯酚化合物与(b) 式中 R3 和 R4 均为-的化合物，R3 和 R4 可以相同或不同，在酸性催化剂存在下进行反应。 所得反应产物与醛化合物（如 HCHO）在酸性催化剂或碱性催化剂存在下进行反应，生成可模塑、高柔性和耐热的酚醛树脂。
• Thermosensitive recording sheet
  申请人：JUJO PAPER CO., LTD.

  公开号：EP0391434A1

  公开（公告）日：1990-10-10

  A thermosensitive recording sheet comprising a support and a thermosensitive color developer layer thereon containing a basic leuco dye and an organic color developer, said layer containing a bis-phenyl sulfone compound selected from bis-(3-phenyl-4-hydroxyphenyl)sul­fone and bis-(2-methyl-4-hydroxy-5-cyclohexylphenyl)sul­fone as the organic color developer.

  一种热敏记录薄片，包括一个支架和其上的热敏显色层，热敏显色层含有碱性白兰地染料和有机显色剂，所述热敏显色层含有选自双-(3-苯基-4-羟基苯基)砜和双-(2-甲基-4-羟基-5-环己基苯基)砜的双苯砜化合物作为有机显色剂。
• OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Kansai Research Institute, Inc.

  公开号：EP1375463A1

  公开（公告）日：2004-01-02

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):         A-[(J)m-(X-Pro)]n     (1)    wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  光活性化合物与光敏剂结合使用，光敏剂由下式（1）表示： A-[(J)m-(X-Pro)]n (1) 其中 A 代表疏水单元，包括至少一种选自烃基和杂环基的疏水基团；J 代表连接基团；X-Pro 代表亲水基团，该亲水基团受保护基团 Pro 的保护，该保护基团可通过光照去除；m 代表 0 或 1；n 代表不小于 1 的整数。 保护基 Pro 可以通过与光敏剂（特别是光酸发生器）一起进行光照射而去除，也可以是疏水保护基。亲水基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度，因此在抗蚀剂应用中，光活性化合物可用于形成具有高分辨率的图案。
• Novel urea (thiourea) derivative and thermal recording sheet using same
  申请人：NIPPON PAPER INDUSTRIES CO., LTD.

  公开号：EP0699662B1

  公开（公告）日：1998-10-21