申请人:——
公开号:US20010037037A1
公开(公告)日:2001-11-01
The invention relates to the use of oximesulfonic acid esters of formula I
1
wherein m is 0 or 1 and x is 1 or 2; R
1
is, for example, substituted phenyl, R
2
has, for example, one of the meanings of R
1
or is unsubstituted phenyl, C
1
-C
6
alkanoyl, unsubstituted or substituted benzoyl, C
2
-C
6
alkoxycarbonyl or phenoxycarbonyl; or R
1
and R
2
, if necessary together with the CO group, form a ring, R
3
, when x is 1, is, for example, C
1
-C
18
alkyl, phenyl or phenanthryl, the radicals phenyl and phenanthryl being unsubstituted or substituted, or R
3
, when x is 2, is, for example, C
2
-C
12
alkylene, phenylene or oxydiphenylene, the radicals phenylene and oxydiphenylene being unsubstituted or substituted, as latent acid donors, especially at wavelengths over 390 nm, and to the use of the compounds in the production of photoresists.
该发明涉及使用式I1的羟胺磺酸酯,其中m为0或1,x为1或2;R1为例如取代苯基,R2为例如具有R1的一种含义或为未取代苯基、C1-C6烷酰基、未取代或取代苯甲酰基、C2-C6烷氧羰基或苯氧羰基;或者如果必要,R1和R2连同CO基团一起形成环,当x为1时,R3为例如C1-C18烷基、苯基或苯并芘基,其中苯基和苯并芘基未取代或取代,或当x为2时,R3为例如C2-C12烷基、苯基或氧二苯基,其中苯基和氧二苯基未取代或取代,作为潜在酸供体,特别是在波长超过390纳米时,以及在光阻剂的生产中使用这些化合物。