2-(methacryloyloxy)ethyltrifluoromethanesulfonamide

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: 2-(methacryloyloxy)ethyltrifluoromethanesulfonamide
• 英文别名: 2-{[(trifluoromethyl)sulfonyl]amino}ethyl 2-methylacrylate；2-(trifluoromethylsulfonylamino)ethyl 2-methylprop-2-enoate
• 化学式: C₇H₁₀F₃NO₄S
• 分子量: 261.222
• InChiKey: FPOSNZIGNWKAGA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  16
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  80.8
• 氢给体数：
  1
• 氢受体数：
  8

反应信息

• 作为反应物：
  描述：

  2-(methacryloyloxy)ethyltrifluoromethanesulfonamide 在 水 、 sodium hydroxide 作用下， 以 1,4-二氧六环 为溶剂， 反应 24.5h， 生成 2-(三氟甲基)磺酰胺乙醇
  参考文献：
  名称：

  JP5658534

  摘要：

  公开号：
• 作为产物：
  描述：

  三氟甲烷磺酰氯 、 甲基丙烯酸 2-氨基乙基酯盐酸盐 在 吩噻嗪 、 三乙胺 作用下， 以 乙腈 为溶剂， 反应 2.0h， 以18.6%的产率得到2-(methacryloyloxy)ethyltrifluoromethanesulfonamide
  参考文献：
  名称：

  Process for producing fluorine-containing alkylsulfonylaminoethyl a-substitued acrylate

  摘要：

  本发明提供了一种制备含氟烷基磺酰胺基乙基α-取代丙烯酸酯的方法，其通式为[3]，包括将通式[1a]的氨基乙基α-取代丙烯酸酯或其盐与通式[2a]的含氟烷基磺酰卤或通式[2b]的含氟烷基磺酐反应。

  公开号：

  US20050240052A1

文献信息

• SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160052877A1

  公开（公告）日：2016-02-25

  A salt represented by the formula (I); wherein Q 1 and Q 2 each independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, L b1 represents a single bond or a divalent C 1 to C 24 saturated hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C 3 to C 18 alicyclic hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C 6 to C 20 aromatic hydrocarbon group, and Z + represents an organic sulfonium cation or an organic iodonium cation.

  根据您的要求，以下是化合物的中文翻译： 由公式(I)表示的盐； 其中Q1和Q2各自独立代表一个氟原子或一个C1至C6的过氟代烷基团，Lb1代表一个单键或一个二价的C1至C24的饱和烃基团，其中甲基烯基团可以被一个氧原子或一个羰基团所取代，并且其中氢原子可以被一个羟基或一个氟原子所取代，并且Y代表一个氢原子，一个氟原子，或一个可选地被取代的C3至C18的芳环烃基团，其中甲基烯基团可以被一个氧原子，一个羰基团或一个磺酰基团所取代；并且Ar代表一个二价的C6至C20的芳香烃基团，以及Z+代表一个有机硫正离子或一个有机碘正离子。
• RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170371241A1

  公开（公告）日：2017-12-28

  A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Va 1 is a divalent hydrocarbon group. n a1 represents an integer of 0 to 2. Ra′ 12 and Ra′ 13 are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra′ 14 is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), R b1 represents a cyclic hydrocarbon group. Y b1 represents a divalent linking group containing an ester bond. V b1 represents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and M m+ is an m-valent organic cation.

  一种电阻组分，包含具有一般式（a0-1）所代表的结构单元的树脂组分，以及一种由一般式（b1）所代表的化合物。在一般式（a0-1）中，R是氢原子、烷基或卤代烷基。Va1是双价碳氢基团。na1表示0至2的整数。Ra′12和Ra′13是具有1至10个碳原子的单价链饱和碳氢基团或氢原子。Ra′14是苯基、萘基或蒽基。在一般式（b1）中，Rb1代表环烃基。Yb1代表含有酯键的双价连接基团。Vb1代表烷基、氟化烷基或单键。m是1或更多的整数，Mm+是m价有机阳离子。
• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170176855A1

  公开（公告）日：2017-06-22

  A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B1) represented by general formula (b1) shown below (in general formula (b1), R b1 represents a bridged alicyclic group having 7 to 30 carbon atoms and containing a polar group; Y b1 represents a linear hydrocarbon group of 9 or more carbon atoms which may have a substituent excluding at least one member selected from the group consisting of an aromatic hydrocarbon group and a vinyl group; V b1 represents a fluorinated alkylene group; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m). R b1 —Y b1 —V b1 —SO 3 − (M m+ ) 1/m (b1)

  一种抗蚀组合物，在暴露后产生酸，并在酸的作用下在显影溶液中表现出改变的溶解度，包括在酸的作用下在显影溶液中表现出改变的溶解度的基组分（A）和在暴露后产生酸的酸生成组分（B），其中酸生成组分（B）包括下面所示的一般式（b1）表示的化合物（B1）（在一般式（b1）中，Rb1代表具有7至30个碳原子并含有极性基团的桥环脂环基团；Yb1代表具有9个或更多碳原子的线性烃基团，可能具有一个取代基，但不包括由芳香烃基团和乙烯基组成的至少一种成员；Vb1代表氟代烷基烯基团；m表示1或更多的整数；Mm+代表价数为m的有机阳离子）。Rb1—Yb1—Vb1—SO3−(Mm+)1/m（b1）
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200174365A1

  公开（公告）日：2020-06-04

  A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, R bd1 to R bd3 each independently represent an aryl group which may have a substituent, provided that one or more of R bd1 to R bd3 are aryl groups having a fluorinated alkyl group which may have a substituent, and at least one of the fluorinated alkyl groups which may have a substituent in these aryl groups is bonded to a carbon atom adjacent to a carbon atom that is bonded to a sulfur atom in the formula, and a total number of the fluorinated alkyl groups which may have a substituent is 2 or more; X − represents a counter anion.

  一种抗蚀组合物，含有基础材料组分，其在显影溶液中的溶解性由酸的作用和由化合物代表的公式（bd1）改变；在公式中，Rbd1到Rbd3各自独立地代表可能具有取代基的芳基，前提是Rbd1到Rbd3中的一个或多个是可能具有取代基的芳基，而这些芳基中至少有一个可能具有取代基的氟代烷基与公式中与硫原子相结合的碳原子相邻的碳原子结合，可能具有取代基的氟代烷基的总数为2或更多；X−代表一个对离子。
• NOVEL COMPOUND
  申请人：UTSUMI Yoshiyuki

  公开号：US20120149916A1

  公开（公告）日：2012-06-14

  A compound represented by general formula (c1) (R 1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M + represents an organic cation or a metal cation).

  一个由一般公式表示的化合物（c1）（R1代表一个含有5个或更多碳原子的脂环基团，可能带有取代基; X代表双价连接基团; Y代表线性、支链或环烷基团或芳基团; Rf代表含有氟原子的烃基团; M+代表有机阳离子或金属阳离子）。