The present disclosure provides compositions including biobased monomers derived from biological sources for the synthesis of polymers from bioderived carbon. The monomers and resulting polymers are comparable to petroleum derived monomers and polymers, but have a carbon isotope ratio characteristic of bioderived materials. Methods for synthesizing polymers having 100% biobased materials are also disclosed.
We synthesized a new family of chemicallyrecyclable polymers in a large scale from the sustainable monomers H2O, COS, and diacrylates. Such resultant polymers manifest impressive toughness and ductility comparable to commodity polyethylene. The chemicalrecycling of these polymers can be readily achieved through two closed loops.
我们从可持续单体 H 2 O、COS 和二丙烯酸酯中大规模合成了一系列新的化学可回收聚合物。此类所得聚合物表现出与商品聚乙烯相当的令人印象深刻的韧性和延展性。这些聚合物的化学回收可以很容易地通过两个闭环实现。
CURABLE COMPOSITION FOR IMPRINTING, CURED PRODUCT, PATTERN FORMING METHOD, LITHOGRAPHY METHOD, PATTERN, MASK FOR LITHOGRAPHY, AND POLYMERIZABLE COMPOSITION FOR IMPRINTING
申请人:FUJIFILM Corporation
公开号:US20200157267A1
公开(公告)日:2020-05-21
The curable composition for imprinting includes: a compound represented by the following Formula (1); a radically polymerizable compound other than the compound represented by Formula (1); and a photoradical polymerization initiator, in Formula (1), R
1
and R
2
each independently represent a hydrogen atom or an organic group having 1 to 8 carbon atoms and may be bonded to each other to form a ring, R
3
represents a monovalent organic group, and R
4
and R
5
each independently represent a hydrogen atom or a monovalent organic group.
KIT, COMPOSITION FOR FORMING UNDERLAYER FILM FOR IMPRINTING, LAMINATE, AND PRODUCTION METHOD USING THE SAME
申请人:FUJIFILM Corporation
公开号:US20200363718A1
公开(公告)日:2020-11-19
Provided is a kit including a curable composition for imprinting which contains a polymerizable compound having an aromatic ring and a composition for forming an underlayer film for imprinting which contains a polymer and a solvent, in which the polymer contains at least one kind of specific constitutional unit and has a polymerizable group, a film formed of the composition for forming an underlayer film for imprinting is a solid film at 23° C., and a portion that has a continuous partial structure containing an aromatic ring which is included in the polymerizable compound and accounts for 60% by mass or more of the polymerizable compound is common to a continuous partial structure containing an aromatic ring which is included in a substituent R in a side chain in the polymer. Furthermore, the present invention relates to a composition for forming an underlayer film for imprinting which is used in combination with a curable composition for imprinting; a laminate; a method for producing a laminate; a method for producing a cured product pattern; and a method for manufacturing a circuit board.
COMPOSITION FOR FORMING PATTERN, KIT, CURED FILM, LAMINATE, PATTERN PRODUCING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT
申请人:FUJIFILM Corporation
公开号:US20220009153A1
公开(公告)日:2022-01-13
Provided are: a composition for forming a pattern, which contains a polymerizable compound, a photopolymerization initiator, and a sensitizer containing two or more of at least one kind of atom selected from the group consisting of a nitrogen atom and a sulfur atom, in which a length of a specific atom chain from one atom to another atom among the two or more atoms is 2 or 3 in terms of the number of atoms; a kit to which the composition for forming a pattern is applied; a cured film; a laminate; a pattern producing method; and a method for manufacturing a semiconductor element.