申请人:Fujisawa Pharmaceutical Co., Ltd.
公开号:US04382934A1
公开(公告)日:1983-05-10
A compound of the general formula: ##STR1## wherein R.sup.1 and R.sup.2 are hydrogen, halogen, lower alkyl, lower alkoxy, halo (lower) alkyl, lower alkanoylamino, lower alkoxyalylamino, or a 5 to 6 membered saturated or unsaturated heterocyclic group having at least one imino group, and selected from the group consisting of pyrrolidinyl, pyrrolinyl, imidazolidinyl, piperazinyl, piperidyl, and morpholynyl, or R.sup.1 and R.sup.2 are combined together to form a benzene ring, R.sup.3 is oxo or a group of the formula .dbd.N--OR.sup.5, in which R.sup.5 is hydrogen or lower alkyl, R.sup.4 is mono- or di- or triphenyl (lower) alkyl, A is C.sub.1 to C.sub.7 alkylene and its hydroxy derivatives, Y is (C.sub.1 to C.sub.3) alkylene, or a pharmaceutically acceptable salt thereof. Said compounds having antiallergic properties represent inclusively all of the possible optical and/or geometrical isomers due to the asymmetric carbon and carbon-nitrogen double bond.
通用公式的化合物:##STR1##其中R.sup.1和R.sup.2是氢、卤素、较低的烷基、较低的烷氧基、卤代(较低的)烷基、较低的烷酰氨基、较低的烷氧基烷氨基,或者是至少含有一个亚胺基的5到6元饱和或不饱和杂环基,选自吡咯烷基、吡咯烯基、咪唑烷基、哌嗪基、哌啶基和吗啉基,或者R.sup.1和R.sup.2结合在一起形成苯环,R.sup.3是氧代或具有.dbd.N--OR.sup.5的基团,其中R.sup.5是氢或较低的烷基,R.sup.4是单、双或三苯基(较低的)烷基,A是C.sub.1到C.sub.7烷基及其羟基衍生物,Y是(C.sub.1到C.sub.3)烷基,或其药用可接受盐。所述具有抗过敏特性的化合物包括由于不对称碳和碳-氮双键而具有的所有可能的光学和/或几何异构体。