diglycidyl 1,3-adamantanedicarboxylate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: diglycidyl 1,3-adamantanedicarboxylate
• 英文别名: Bis(oxiran-2-ylmethyl) adamantane-1,3-dicarboxylate
• 化学式: C₁₈H₂₄O₆
• 分子量: 336.385
• InChiKey: WABAGKLGXYZOEX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.1
• 重原子数：
  24
• 可旋转键数：
  8
• 环数：
  6.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  77.7
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为产物：
  描述：

  1,3-金刚烷二甲酸 、 缩水甘油 在 N,N'-羰基二咪唑 作用下， 以 乙腈 为溶剂， 反应 6.0h， 生成 diglycidyl 1,3-adamantanedicarboxylate
  参考文献：
  名称：

  TW2019/36591

  摘要：

  公开号：

文献信息

• JP2015/17076
  申请人：——

  公开号：——

  公开（公告）日：——
• SHIRYAEV A. K., MATER. 9 KONF. MOL. UCHENYX YH-TA DRUZHBY NARODOV, MOSKVA, 15-19 APR., 19+
  作者：SHIRYAEV A. K.

  DOI：——

  日期：——
• RESIST UNDERLAYER FILM FORMING COMPOSITION AND METHOD OF FORMING RESIST PATTERN USING THE SAME
  申请人：Sakamoto Rikimaru

  公开号：US20100221657A1

  公开（公告）日：2010-09-02

  There is provided a composition for forming a resist underlayer film not only having a large selection ratio of a dry etching rate but also exhibiting desired values of the k value and of the refractive index n at a short wavelength such as a wavelength of an ArF excimer laser. A resist underlayer film forming composition for lithography comprising: a linear polymer; and a solvent, wherein a backbone of the linear polymer has a unit structure in which 2,4-dihydroxy benzoic acid is introduced through an ester bond and an ether bond.
• RESIST UNDERLAYER FILM FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
  申请人：Hiroi Yoshiomi

  公开号：US20100266951A1

  公开（公告）日：2010-10-21

  There is provided a composition for forming a resist underlayer film having a large selection ratio of dry etching rate, exhibiting desired values of the k value and the refractive index n at a short wavelength, for example, in an ArF excimer laser, and further, exhibiting solvent resistance. A resist underlayer film forming composition for lithography comprises a linear polymer having, in a main chain thereof, at least one of an aromatic ring-containing structure and a nitrogen atom-containing structure; and a solvent, wherein to the aromatic ring or the nitrogen atom, at least one alkoxyalkyl group or hydroxyalkyl group is directly bonded.
• COMPOUND, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20190250508A1

  公开（公告）日：2019-08-15

  The present invention can provide a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition. A resist composition comprising a resin including a structural unit having an acid-labile group, an acid generator and a compound represented by formula (I): wherein, in formula (I), R 1 represents a hydrocarbon group having 1 to 36 carbon atoms which may have a substituent, X 1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O—, and * represents a bonding site to R 1 , L 1 represents a single bond or a hydrocarbon group having 1 to 36 carbon atoms which may have a substituent, and —CH 2 — included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —SO 2 —, R 2 represents a saturated hydrocarbon group having 1 to 12 carbon atoms, u1 represents an integer of 0 to 2, s1 represents 1 or 2, t1 represents 0 or 1, in which s1+t1 is 1 or 2, n represents an integer of 2 or more, and a plurality of X 1 , L 1 , s1, t1, R 2 and u1 each may be the same or different from each other.