2-cyanomethyl-2-adamantyl methacrylate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-cyanomethyl-2-adamantyl methacrylate
• 英文别名: [2-(cyanomethyl)-2-adamantyl] 2-methylprop-2-enoate
• 化学式: C₁₆H₂₁NO₂
• 分子量: 259.348
• InChiKey: WTPUKAHRAQLKAP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  19
• 可旋转键数：
  4
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.75
• 拓扑面积：
  50.1
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  lithium 2-cyanomethyl-2-adamantoxide 、 甲基丙烯酸酐 在 三乙胺 作用下， 以 四氢呋喃 、 正己烷 为溶剂， 反应 1.0h， 生成 2-cyanomethyl-2-adamantyl methacrylate
  参考文献：
  名称：

  Adamantane derivative and production process for the same

  摘要：

  提供了一种以式（I）表示的结构为特征的金刚烷衍生物，以及一种生产金刚烷衍生物的方法，在上述式（I）中n为0，在该方法中，金刚烷化合物与腈化合物反应，然后与（甲基）丙烯酸的酸卤或酸酐反应。具有以式（I）表示的结构为特征的金刚烷衍生物是一种新型金刚烷衍生物，可用作光刻领域中光敏树脂等功能树脂的单体，并且可通过上述生产方法高效生产。

  公开号：

  US20060167302A1

文献信息

• Cyanoadamantyl compounds and polymers
  申请人：Rohm and Haas Electronic Materials, L.L.C.

  公开号：EP1586944A1

  公开（公告）日：2005-10-19

  Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 nm.

  本发明提供了氰基金刚烷化合物、包括这种化合物聚合单元的聚合物以及包括这种聚合物的光阻组合物。本发明的优选聚合物用于在小于250纳米的波长下进行成像的光阻，例如248纳米和193纳米。
• Cyanoadamantyl compounds and polymers and photoresists comprising same
  申请人：Bae C. Young

  公开号：US20050208417A1

  公开（公告）日：2005-09-22

  Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 nm.

  提供了Cyanoadamantyl化合物、包括这种化合物聚合单元的聚合物以及包括这种聚合物的光刻胶组成物。本发明的优选聚合物在小于250nm的波长下进行成像的光刻胶中使用，例如248nm和193nm。
• PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR CORPORATION

  公开号：US20130224661A1

  公开（公告）日：2013-08-29

  A pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed. A developer solution used in developing the exposed resist film includes no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a first polymer and a radiation-sensitive acid generator. The first polymer includes a first structural unit having an acid-labile group and an alicyclic group. The alicyclic group is capable of avoiding dissociation from a molecular chain by an action of an acid.

  一种形成图案的方法包括在基板上涂覆辐射敏感的树脂组合物以提供抗蚀膜。抗蚀膜被曝光。曝光的抗蚀膜被显影。用于显影曝光的抗蚀膜的显影剂溶液包括不少于80%的有机溶剂。辐射敏感的树脂组合物包括第一聚合物和辐射敏感的酸发生剂。第一聚合物包括具有酸不稳定基团和脂环族基团的第一结构单元。脂环族基团能够通过酸的作用避免从分子链中解离。
• ADAMANTANE DERIVATIVE AND PROCESS FOR PRODUCING THE SAME
  申请人：IDEMITSU KOSAN CO., LTD.

  公开号：EP1731504A1

  公开（公告）日：2006-12-13

  Provided are an adamantane derivative characterized by having a structure represented by Formula (I) and a process for producing an adamantane derivative in which n is 0 in Formula (I) described above, wherein an adamantane compound is reacted with a nitrile compound and then with acid halide or acid anhydride of (meth)acrylic acids. The adamantane derivative characterized by having a structure represented by Formula (I) is a novel adamantane derivative which is useful as a monomer for functional resins such as a photosensitive resin in the photolithograpy field, and it can efficiently be produced by the production process described above.

  本发明提供了一种金刚烷衍生物，其特征在于具有由式（I）表示的结构，并提供了一种生产上述式（I）中 n 为 0 的金刚烷衍生物的工艺，其中金刚烷化合物与腈化合物反应，然后与（甲基）丙烯酸的酸卤化物或酸酐反应。金刚烷衍生物的结构如式（I）所示，是一种新型金刚烷衍生物，可用作光刻领域中光敏树脂等功能性树脂的单体，并可通过上述生产工艺高效生产。
• Silicon-containing underlayers
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US10007184B2

  公开（公告）日：2018-06-26

  Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.

  本发明提供了由一种或多种含硅聚合物（其骨架由 Si-O 链接组成）、一种或多种有机共混聚合物和固化催化剂组成的可湿式硬化底层组合物。这些组合物可用于制造各种电子设备。