An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that can form independent line patterns with high resolution and excellent shapes and shows excellent resist performances including roughness characteristics, and to provide an actinic ray-sensitive or radiation-sensitive film and a pattern forming method using the composition.
The actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group is substituted with a group represented by the following General Formula (1) (the respective symbols in the formula represent the same definitions as in the claims and the specification).
本发明的目的是提供一种光致或辐射致敏
树脂组合物,该组合物可以形成具有高分辨率和优秀形状的独立线型图案,并显示出包括粗糙特性在内的优异的抗阻性能,以及提供使用该组合物的光致或辐射致敏膜和图案形成方法。光致或辐射致敏
树脂组合物包含一种化合物(P),该化合物含有至少一个
酚羟基和至少一个
氢原子被代表如下通式(1)的基团取代的
酚羟基的基团(式中各符号与权利要求书和说明书中的定义相同)。