3-(2-cyanoethoxy)-1-adamantyl methacrylate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 3-(2-cyanoethoxy)-1-adamantyl methacrylate
• 英文别名: [3-(2-Cyanoethoxy)-1-adamantyl] 2-methylprop-2-enoate
• 化学式: C₁₇H₂₃NO₃
• 分子量: 289.375
• InChiKey: RTDLOEACZNUGPW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  21
• 可旋转键数：
  6
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.76
• 拓扑面积：
  59.3
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  3-methanesulfonyloxy-1-adamantyl methacrylate 、 3-羟基丙腈 在 三乙胺 作用下， 反应 2.0h， 生成 3-(2-cyanoethoxy)-1-adamantyl methacrylate
  参考文献：
  名称：

  EP1712542

  摘要：

  公开号：

文献信息

• Adamantane derivatives and process for producing the same
  申请人：Hatakeyama Naoyoshi

  公开号：US20070129532A1

  公开（公告）日：2007-06-07

  The present invention provides an adamantane derivative (I) having a structure represented by the general formula (I); an adamantane derivative (II) having a structure represented by the general formula (II); and a process for producing those adamantane derivatives. An alcohol form of an adamantane compound is reacted with a sulfonyl compound to obtain the adamantane derivative (II), which is then reacted with an alcohol to obtain the adamantane derivative (I). The adamantane derivative (I) and adamantane derivative (II) each having the structure represented by the general formula (I) and general formula (II), respectively, is a novel adamantyl(meth)acrylate compound and useful as a monomer for functional resins such as a photosensitive resin in the field of photolithography.

  本发明提供了一种具有通式（I）所表示的结构的金刚烷衍生物（I）；一种具有通式（II）所表示的结构的金刚烷衍生物（II）；以及用于制备这些金刚烷衍生物的方法。将金刚烷化合物的醇形式与磺酰化合物反应，以获得金刚烷衍生物（II），然后将其与醇反应以获得金刚烷衍生物（I）。具有通式（I）和通式（II）所表示的金刚烷衍生物分别是一种新的金刚烷基（甲基）丙烯酸酯化合物，并且在光刻领域的光敏树脂等功能性树脂的单体中有用。
• PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR CORPORATION

  公开号：US20130224661A1

  公开（公告）日：2013-08-29

  A pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed. A developer solution used in developing the exposed resist film includes no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a first polymer and a radiation-sensitive acid generator. The first polymer includes a first structural unit having an acid-labile group and an alicyclic group. The alicyclic group is capable of avoiding dissociation from a molecular chain by an action of an acid.

  一种形成图案的方法包括在基板上涂覆辐射敏感的树脂组合物以提供抗蚀膜。抗蚀膜被曝光。曝光的抗蚀膜被显影。用于显影曝光的抗蚀膜的显影剂溶液包括不少于80%的有机溶剂。辐射敏感的树脂组合物包括第一聚合物和辐射敏感的酸发生剂。第一聚合物包括具有酸不稳定基团和脂环族基团的第一结构单元。脂环族基团能够通过酸的作用避免从分子链中解离。
• ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME
  申请人：HATAKEYAMA Naoyoshi

  公开号：US20090156854A1

  公开（公告）日：2009-06-18

  The present invention provides an adamantane derivative (I) having a structure represented by the general formula (I); an adamantane derivative (II) having a structure represented by the general formula (II); and a process for producing those adamantane derivatives. An alcohol form of an adamantane compound is reacted with a sulfonyl compound to obtain the adamantane derivative (II), which is then reacted with an alcohol to obtain the adamantane derivative (I). The adamantane derivative (I) and adamantane derivative (II) each having the structure represented by the general formula (I) and general formula (II), respectively, is a novel adamantyl (meth)acrylate compound and useful as a monomer for functional resins such as a photosensitive resin in the field of photolithography.

  本发明提供一种由一般式(I)表示的结构的金刚烷衍生物（I）; 一种由一般式(II)表示的结构的金刚烷衍生物（II）; 以及制备这些金刚烷衍生物的过程。将一种金刚烷化合物的醇形式与磺酰化合物反应，得到金刚烷衍生物（II），然后将其与醇反应，得到金刚烷衍生物（I）。具有由一般式(I)和一般式(II)表示的结构的金刚烷衍生物（I）和金刚烷衍生物（II）是一种新型的金刚烷基（甲基）丙烯酸酯化合物，并且在光刻领域的光敏树脂等功能性树脂的单体方面非常有用。
• POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
  申请人：Utsumi Yoshiyuki

  公开号：US20130022911A1

  公开（公告）日：2013-01-24

  A polymer containing an anion part which generates acid upon exposure on at least one terminal of the main chain, and at least one structural unit selected from the group consisting of a structural unit (a0) containing a —SO 2 -containing cyclic group, a structural unit (a3) containing at least one group selected from the group consisting of —OH, —COOH, —CN, —SO 2 NH 2 and —CONH 2 and a structural unit (a5) which generates acid upon exposure.
• US7528279B2
  申请人：——

  公开号：US7528279B2

  公开（公告）日：2009-05-05