申请人:Connlab Holdings Limited
公开号:US04039530A1
公开(公告)日:1977-08-02
The invention relates to compounds of the formula: ##STR1## wherein R stands for lower alkyl, aryl, heteroaryl, benzyl, heteroarylloweralkyl, phenoxyloweralkyl, phenylthioloweralkyl, 4-amino-1-butyl and suitably protected derivatives, .alpha.-aminobenzyl and protected derivatives such as the carbamates (benzyl, trichloroethyl and methoxymethyl) and aldehyde and ketone adducts, .alpha.-hydroxybenzyl and protected derivatives, .alpha.-carboxybenzyl and protected derivatives, .alpha.-sulfobenzyl and protected derivatives, the radical R.sup.5 O--, R.sup.5 S--, or R.sup.5 R.sup.6 N--, wherein R.sup.5 and R.sup.6 may be the same or different and each be taken from the group lower alkyl, aryl, arylloweralkyl and heteroaryl and additionally, in the case of R.sup.5 R.sup.6 N--, R.sup.5 and/or R.sup.6 may be hydrogen; R.sup.1 is hydrogen or a cleavable radical such as loweralkoxymethyl, acyloxymethyl, loweralkylthiomethyl, loweralkyl, 2,2,2-trichloroethyl, benzyl, substituted (nitro, methoxy or halo) benzyl, benzhydryl, phenacyl or trialkylsilyl; R.sup.2 is hydrogen or methoxy; R.sup.3 stands for lower alkyl, aryl, arylloweralkyl, heteroaryl, and the radicals R.sup.5 O--, R.sup.5 S--, R.sup.5 R.sup.6 N--, or R.sup.5 R.sup.6 NR.sup.7 N-- wherein R.sup.5 and R.sup.6 have the same meaning set forth above; and R.sup.7 has the same meaning as R.sup.5 or R.sup.6 including hydrogen, and R.sup.4 has the same meaning as R.sup.5 or R.sup.6 including hydrogen. Broken lines at positions 3 and 4 in the formula indicate a double bond in either of the two positions; The novel compounds are useful intermediates in the preparation of cephalosporins and penicillins.
该发明涉及以下结构的化合物:##STR1## 其中R代表较低的烷基、芳基、杂芳基、苄基、杂芳基较低烷基、苯氧基较低烷基、苯硫较低烷基、4-氨基-1-丁基和适当保护的衍生物,α-氨基苄和保护的衍生物,如氨基甲酸酯(苄基、三氯乙基和甲氧基甲基)和醛和酮加合物,α-羟基苄和保护的衍生物,α-羧基苄和保护的衍生物,α-磺基苄和保护的衍生物,基团R.sup.5 O--、R.sup.5 S--或R.sup.5 R.sup.6 N--,其中R.sup.5和R.sup.6可以相同也可以不同,并且每个都可以来自较低烷基、芳基、芳基较低烷基和杂芳基的群体,另外,在R.sup.5 R.sup.6 N--的情况下,R.sup.5和/或R.sup.6可以是氢;R.sup.1是氢或可裂解的基团,如较低烷氧甲基、酰氧甲基、较低烷硫甲基、较低烷基、2,2,2-三氯乙基、苄基、取代(硝基、甲氧基或卤素)苄基、苄基、苯乙酰基或三烷基硅基;R.sup.2是氢或甲氧基;R.sup.3代表较低烷基、芳基、芳基较低烷基、杂芳基和基团R.sup.5 O--、R.sup.5 S--、R.sup.5 R.sup.6 N--或R.sup.5 R.sup.6 NR.sup.7 N--,其中R.sup.5和R.sup.6具有上述相同的含义;R.sup.7具有与R.sup.5或R.sup.6相同的含义,包括氢,R.sup.4具有与R.sup.5或R.sup.6相同的含义,包括氢。在公式中3和4位置的虚线表示两个位置中的一个有双键;这些新化合物在头孢菌素和青霉素的制备中是有用的中间体。