5-chloro-2,4-dinitro-benzaldehyde

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 5-chloro-2,4-dinitro-benzaldehyde
• 英文别名: 5-Chlor-2,4-dinitro-benzaldehyd；5-Chloro-2,4-dinitrobenzaldehyde；5-chloro-2,4-dinitrobenzaldehyde
• 化学式: C₇H₃ClN₂O₅
• 分子量: 230.564
• InChiKey: SIEMMDPGIAMWAQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  15
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  109
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为产物：
  描述：

  5-氯-2,4-二硝基甲苯 、 N,N-二甲基-4-亚硝基苯胺 在 乙醇 、 sodium carbonate 作用下， 生成 5-chloro-2,4-dinitro-benzaldehyde
  参考文献：
  名称：

  Mittal, Journal of the Indian Chemical Society, 1942, vol. 19, p. 408

  摘要：

  DOI：

文献信息

• Photolabile esters and their uses
  申请人：——

  公开号：US20040242653A1

  公开（公告）日：2004-12-02

  Compounds which are capable of generating acid on photolysis are disclosed, and the uses of these compounds, especially for deprotecting the termini of nucleic acid molecules or peptides during synthesis of arrays. The compounds described herein may be employed in the detritylation of 5′-O-dimethoxytrityl (DMT) protected nucleotides by photolysing the compounds to generate an acid capable of removing the DMT group allowing oligonucleotide arrays to be synthesised using readily available 5′-O-DMT-nucleoside-3′-O-phosphoramidite monomers conventionally used in solid phase nucleic acid synthesis. A method of avoiding the effects of stray light in projection lithography techniques is also disclosed.

  本文披露了能够在光解作用下产生酸的化合物，并介绍了这些化合物的用途，特别是在合成阵列期间去保护核酸分子或肽的末端。本文所描述的化合物可用于通过光解产生能够去除DMT基团的酸来去除5'-O-二甲氧基三苯基甲酰（DMT）保护的核苷酸，从而使用常规固相核酸合成中使用的易得的5'-O-DMT-核苷酸-3'-O-磷酸酰胺单体合成寡核苷酸阵列。本文还披露了一种避免投影光刻技术中杂散光影响的方法。
• PHOTOLABILE ESTERS AND THEIR USES
  申请人：The Institute of Cancer Research

  公开号：EP1399412A1

  公开（公告）日：2004-03-24
• US7301049B2
  申请人：——

  公开号：US7301049B2

  公开（公告）日：2007-11-27
• [EN] PHOTOLABILE ESTERS AND THEIR USES<br/>[FR] ESTERS PHOTOLABILES ET LEURS UTILISATIONS
  申请人：CANCER RES INST

  公开号：WO2003000644A1

  公开（公告）日：2003-01-03

  Compounds which are capable of generating acid on photolysis are disclosed, and the uses of these compounds, especially for deprotecting the termini of nucleic acid molecules or peptides during synthesis of arrays. The compounds described herein may be employed in the detritylation of 5'-O-dimethoxytrityl (DMT) protected nucleotides by photolysing the compounds to generate an acid capable of removing the DMT group allowing oligonucleotide arrays to be synthesised using readily available 5'-O-DMT-nucleoside-3'-O-phosphoramidite monomers conventionally used in solid phase nucleic acid synthesis. A method of avoiding the effects of stray light in projection lithography techniques is also disclosed.
• Mittal, Journal of the Indian Chemical Society, 1942, vol. 19, p. 408
  作者：Mittal

  DOI：——

  日期：——