申请人:Jung Sung-Do
公开号:US20090291390A1
公开(公告)日:2009-11-26
An acid generating agent represented by the following formula (1) or (2) is provided, which is included in chemically amplified resist compositions:
wherein in the formula (1) and (2), X represents an unsubstituted or substituted alkyl group having 1 to 20 carbon atoms and selected from alkyl, haloalkyl and alkylsulfonyl, which may have at least one hydrogen atom substituted by an ether group, an ester group, a carbonyl group, an acetal group, a nitrile group, a cyano group, a hydroxyl group, a carboxyl group or an aldehyde group, or represents a perfluoroalkyl group having 1 to 4 carbon atoms; R
6
represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a heteroatom selected from nitrogen, sulfur, fluorine and oxygen; m is an integer from 0 to 2; and A+ is an organic counterion.
提供了以下公式(1)或(2)所代表的酸生成剂,该酸生成剂包含在化学增感抗蚀剂组成物中:在公式(1)和(2)中,X代表具有1至20个碳原子的未取代或取代的烷基基团,并且选择自烷基、卤代烷基和烷基磺酰基,该基团可能至少有一个氢原子被醚基团、酯基团、羰基团、缩醛基团、腈基团、氰基团、羟基团、羧基团或醛基团取代,或代表具有1至4个碳原子的全氟烷基基团;R6代表具有1至10个碳原子的烷基基团、具有1至10个碳原子的烷氧基团,或选择自氮、硫、氟和氧的杂原子;m为0至2的整数;A+为有机对离子。