cyclohexyldimethylmethyl methacrylate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: cyclohexyldimethylmethyl methacrylate
• 英文别名: 2-Cyclohexylpropan-2-yl methacrylate；2-cyclohexylpropan-2-yl 2-methylprop-2-enoate
• 化学式: C₁₃H₂₂O₂
• 分子量: 210.316
• InChiKey: OMPLGTOUDZNCGW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  15
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.77
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  环己甲酸甲酯 、 甲基丙烯酸酐 、 碘甲烷 在 lithium 作用下， 以 四氢呋喃 为溶剂， 反应 5.5h， 以62.5%的产率得到cyclohexyldimethylmethyl methacrylate
  参考文献：
  名称：

  環状脂肪族アクリレート類の製造方法

  摘要：

  【问题】提供一种高纯度且高收率的制造环状脂肪族丙烯酸酯的方法。 【解决方案】通过下面的反应式，从金属锂，式（a）表示的卤代烷基，式（b）表示的环状脂肪族酯和式（c）表示的（甲）丙烯酸无水物中，通过中间体式（a'）表示的烷基锂和式（b'）表示的锂醇酸盐，得到式（d）表示的环状脂肪族丙烯酸酯的方法。制造环状脂肪族丙烯酸酯的方法是，在卤代烷基中，金属锂的摩尔比为1.5至2.0的范围内。 【选择图】无

  公开号：

  JP2015107923A

文献信息

• PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION
  申请人：Wada Kenji

  公开号：US20100233617A1

  公开（公告）日：2010-09-16

  A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X—B—R   (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

  一种感光组合物包括：（A）含有与下式（I）所表示的化合物对应的重复单元的树脂；该树脂能够在受到光敏射线或辐射照射后产生酸基团：Z-A-X—B—R   （I）其中Z代表一个能够在受到光敏射线或辐射照射后由阳离子离去而形成酸基团的基团；A代表一个烷基基团；X代表一个单键或含杂原子的二价连接基团；B代表一个单键、一个氧原子或—N（Rx）-；Rx代表一个氢原子或一个一价有机基团；R代表一个通过Y取代的一价有机基团；当B代表—N（Rx）-时，R和Rx可以结合在一起形成一个环；Y代表一个可聚合的基团。
• Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
  申请人：FUJIFILM CORPORATION

  公开号：US10248019B2

  公开（公告）日：2019-04-02

  A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.

  一种形成图案的方法包括：(i) 使用一种含有（A）一种能够在受到光或辐射照射时生成酸并通过酸的作用分解以降低该化合物（A）对有机溶剂的溶解度的光敏或辐射敏感树脂组合物形成薄膜；(ii) 曝光薄膜；和(iii) 使用含有有机溶剂的显影剂进行显影。
• ADAMANTYL (METH)ACRYLIC MONOMER AND (METH)ACRYLIC POLYMER CONTAINING THE SAME AS REPEATING UNIT
  申请人：Furukawa Kikuo

  公开号：US20130023638A1

  公开（公告）日：2013-01-24

  Provided according to the present invention are an adamantyl (meth)acrylate represented by formula (1), having a formazin standard turbidity of less than 1.7 NTU (Nephelometric Turbidity Unit) in methylethylketone or tetrahydrofuran, and also a (meth)acrylic copolymer comprising the adamantyl (meth)acrylate as a repeating unit: (in the formula, R1 represents hydrogen or a methyl group; R2 through R4 each independently represent a hydrogen atom, a hydroxyl group, an alkyl group having a carbon number of 1 to 3, an aryl group, an alkoxy group, an aryloxy group, a halogen group, an alkyl halide group, or a hydroxyalkyl group; and n1 represents 0 or 1).

  根据本发明提供的是一种由式（1）表示的戊二烯基（甲基）丙烯酸酯，在甲基乙基酮或四氢呋喃中具有小于1.7 NTU（浊度单位）的福尔马辛标准浊度，并且还包括一种（甲基）丙烯酸酯共聚物，其中所述戊二烯基（甲基）丙烯酸酯作为重复单元出现：（在式中，R1代表氢或甲基基团；R2至R4分别独立地代表氢原子、羟基、碳数为1至3的烷基基团、芳基、烷氧基、芳氧基、卤素基、烷基卤素基团或羟基烷基基团；n1代表0或1）。
• MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION
  申请人：Koyama Hiroshi

  公开号：US20100297555A1

  公开（公告）日：2010-11-25

  Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by following Formula (1), wherein R a represents, e.g., a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; R 1 represents, e.g., a halogen atom or an alkyl or haloalkyl group having 1 to 6 carbon atoms; “A” represents an alkylene group having 1 to 6 carbon atoms, oxygen atom, sulfur atom, or nonbonding; “m” denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbon atoms. The monomer is useful typically as a monomer component typically for a highly functional polymer, because, when the monomer is applied typically to a resist resin, the resin is satisfactory stable and resistant typically to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.

  揭示了一种具有吸电子取代基和内酯骨架的单体，由以下式（1）表示，其中R代表，例如，氢原子或具有1至6个碳原子的烷基基团；R1代表，例如，卤素原子或具有1至6个碳原子的烷基或卤代烷基基团；“A”代表具有1至6个碳原子的烷基基团、氧原子、硫原子或非键合基团；“m”表示0至8的整数；Xs各自代表吸电子取代基；“n”表示1至9的整数；Y代表具有1至6个碳原子的二价有机基团。该单体通常用作高功能聚合物的单体组分，因为当该单体通常应用于抗蚀树脂时，树脂通常具有较高的稳定性和抗化学品性能，对有机溶剂具有较高的溶解性，并在水解后具有改善的水解性和/或水溶性。
• MONOMER HAVING N-ACYL CARBAMOYL GROUP AND LACTONE SKELETON, AND POLYMERIC COMPOUND
  申请人：DAICEL CORPORATION

  公开号：US20160060374A1

  公开（公告）日：2016-03-03

  Disclosed is a monomer containing an N-acylcarbamoyl group and a lactone skeleton. The monomer is exemplified by Formula (1): where R a is selected typically from hydrogen and C 1 -C 6 alkyl; R 1 is, independently in each occurrence, selected typically from halogen and optionally halogenated C 1 -C 6 alkyl; “A” is selected from C 1 -C 6 alkylene, oxygen, sulfur, and non-bond; m represents an integer of 0 to 8; X represents, independently in each occurrence, specific N-acylcarbamoyl; n represents an integer of 1 to 9; and Y represents a C 1 -C 6 divalent organic group.

  揭示了一种含有N-酰基氨酰基基团和内酯骨架的单体。该单体以式(1)为例，其中R通常选择自氢和C1-C6烷基；R1在每次出现时，通常选择自卤素和可选择卤代的C1-C6烷基；“A”选择自C1-C6亚烷基、氧、硫和非键合；m表示0到8的整数；X在每次出现时独立选择特定的N-酰基氨酰基；n表示1到9的整数；Y代表C1-C6二价有机基团。