双环[2.2.1]庚-2-烯-5-磺酰胺 | 7167-08-0

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 中文名称: 双环[2.2.1]庚-2-烯-5-磺酰胺
• 英文名称: 5-norbornene-2-sulfonamide
• 英文别名: Bicyclo[2.2.1]hept-5-ene-2-sulfonamide
• CAS: 7167-08-0
• 化学式: C₇H₁₁NO₂S
• 分子量: 173.236
• InChiKey: GOUWTBUEZMTPKV-UHFFFAOYSA-N

物化性质

• 沸点：
  326.6±45.0 °C(Predicted)
• 密度：
  1.37±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.2
• 重原子数：
  11
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.71
• 拓扑面积：
  68.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  双环[2.2.1]庚-2-烯-5-磺酰胺 在 碳酸氢钠 、 间氯过氧苯甲酸 作用下， 以 二氯甲烷 为溶剂， 反应 2.0h， 以63%的产率得到5,6-epoxy-2-norbornanesulfonamide
  参考文献：
  名称：

  EP2821403

  摘要：

  公开号：

文献信息

• ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR PRODUCING SAME, INTERMEDIATE AND METHOD FOR PRODUCING SAME, HIGH-MOLECULAR-WEIGHT COMPOUND, AND PHOTORESIST COMPOSITION
  申请人：KURARAY CO., LTD.

  公开号：US20150037733A1

  公开（公告）日：2015-02-05

  Provided is an acrylic acid ester derivative which, when used as a constituent unit of a polymer which is included in a photoresist composition for a semiconductor, exhibits excellent lithography characteristics such as LWR and the like. Specifically, provided is an acrylic acid ester derivative represented by the following general formula (1). Furthermore, provided are an intermediate of the acrylic acid ester derivative and a process for producing the same; a polymer containing the acrylic acid ester derivative as a constituent unit; and a photoresist composition for a semiconductor containing the polymer. wherein, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , m, x, and y are as defined in the text of Description.

  提供的是一种丙烯酸酯衍生物，当用作聚合物的组成单元时，该聚合物包含在半导体光阻组合物中，表现出优异的光刻特性，例如LWR等。具体而言，提供了由以下通式（1）表示的丙烯酸酯衍生物。此外，还提供了丙烯酸酯衍生物的中间体和制备方法；以及含有丙烯酸酯衍生物作为组成单元的聚合物和用于半导体的光阻组合物。其中，R1，R2，R3，R4，R5，R6，R7，R8，R9，R10，R11，R12，R13，m，x和y如描述文本中所定义。
• Acrylic acid ester derivative and method for producing same, intermediate and method for producing same, high-molecular-weight compound, and photoresist composition
  申请人：KURARAY CO., LTD.

  公开号：US09395625B2

  公开（公告）日：2016-07-19

  Provided is an acrylic acid ester derivative which, when used as a constituent unit of a polymer which is included in a photoresist composition for a semiconductor, exhibits excellent lithography characteristics such as LWR and the like. Specifically, provided is an acrylic acid ester derivative represented by the following general formula (1). Furthermore, provided are an intermediate of the acrylic acid ester derivative and a process for producing the same; a polymer containing the acrylic acid ester derivative as a constituent unit; and a photoresist composition for a semiconductor containing the polymer. wherein, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, m, x, and y are as defined in the text of Description.

  提供的是一种丙烯酸酯衍生物，当用作聚合物的组成单元时，该聚合物包含在半导体光刻胶组合物中，表现出优异的光刻特性，如LWR等。具体而言，提供的是由下列通式（1）表示的丙烯酸酯衍生物。此外，还提供了丙烯酸酯衍生物的中间体及其制备方法；含有丙烯酸酯衍生物作为组成单元的聚合物；以及用于半导体的光刻胶组合物，其中，R1、R2、R3、R4、R5、R6、R7、R8、R9、R10、R11、R12、R13、m、x和y在说明文中有定义。
• POLYMER COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
  申请人：Iwashita Jun

  公开号：US20100081080A1

  公开（公告）日：2010-04-01

  A polymer compound including a structural unit (a0) represented by general formula (a0-1) shown below: wherein R 1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms; R 2 and R 3 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R 2 and R 3 may be bonded together to form an alkylene group that may include an oxygen atom or sulfur atom at an arbitrary position, —O— or —S—; R 4 and R 5 each independently represents a hydrogen atom, an alkyl group that may include an oxygen atom at an arbitrary position, a cycloalkyl group that may include an oxygen atom at an arbitrary position or an alkoxycarbonyl group.
• US8021824B2
  申请人：——

  公开号：US8021824B2

  公开（公告）日：2011-09-20
• US9395625B2
  申请人：——

  公开号：US9395625B2

  公开（公告）日：2016-07-19