4-dodecylsulfanyl-2,3,5,6-tetrafluorobenzenesulfonic acid

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-dodecylsulfanyl-2,3,5,6-tetrafluorobenzenesulfonic acid
• 化学式: C₁₈H₂₆F₄O₃S₂
• 分子量: 430.528
• InChiKey: QJAGUVBNQJPAJI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.2
• 重原子数：
  27
• 可旋转键数：
  13
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  88
• 氢给体数：
  1
• 氢受体数：
  8

反应信息

• 作为产物：
  描述：

  aqueous 1M-sodium hydroxide 、 Methylpropanyl pentafluorobenzenesulfonic acid ester 、 四丁基硫酸氢铵 、 十二硫醇 生成 4-dodecylsulfanyl-2,3,5,6-tetrafluorobenzenesulfonic acid
  参考文献：
  名称：

  摘要：

  DOI：

文献信息

• Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition
  申请人：Wada Kenji

  公开号：US20050123859A1

  公开（公告）日：2005-06-09

  A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation; and a pattern forming method using a photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation.

  一种包含能够在受到光敏辐射或辐射照射后生成特定磺酸的化合物的光敏组合物；一种包含能够在受到光敏辐射或辐射照射后生成特定磺酸的化合物的光敏组合物；以及一种使用包含能够在受到光敏辐射或辐射照射后生成特定磺酸的化合物的光敏组合物的图案形成方法。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160280621A1

  公开（公告）日：2016-09-29

  The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R 1 and R 6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R 2 and R 5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R 3 and R 4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R 3 and R 4 may be bonded to each other to form a ring.

  该组合物包含一种碱溶性树脂和一种由下列通式（I）表示的交联剂。在该式中，R1和R6各自独立地表示氢原子或具有5个或更少碳原子的碳氢基团；R2和R5各自独立地表示烷基、环烷基、芳基或酰基；R3和R4各自独立地表示氢原子或具有2个或更多碳原子的有机基团，且R3和R4可以结合形成环。
• PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION
  申请人：KODAMA Kunihiko

  公开号：US20080138742A1

  公开（公告）日：2008-06-12

  The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.

  本发明涉及一种在阳离子部分具有多环碳氢结构的芳基磺酸盐化合物。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, AND COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160280675A1

  公开（公告）日：2016-09-29

  The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.

  感光树脂或辐射敏感树脂组合物包括具有极性转换基团和可溶于碱性树脂的交联剂，其中极性转换基团是一种能够通过碱性水溶液作用分解并在具有交联基团的侧面生成羧酸或磺酸的基团。
• RESIST COMPOSITION AND PATTERN-FORMING METHOD USING SAME
  申请人：Kamimura Sou

  公开号：US20080241737A1

  公开（公告）日：2008-10-02

  A resist composition comprises (A) at least two kinds of resins each of which decomposes by the action of an acid to undergo an increase in its solubility for an alkali developer, wherein at least one kind of the resins (A) is a resin synthesized by living radical polymerization using a chain transfer agent represented by formula (I): wherein: A represents an organic group not containing hetero atoms; and Y represents an organic group capable of releasing a radical.

  一种抗蚀性组合物包括（A）至少两种树脂，每种树脂通过酸的作用分解，以增加其对碱性显影剂的溶解度，其中至少一种树脂（A）是通过使用由式（I）表示的链转移剂合成的活性自由基聚合树脂：其中：A代表不含杂原子的有机基团；Y代表能够释放自由基的有机基团。