Photopatternable Materials and Related Electronic Devices and Methods
申请人:Polyera Corporation
公开号:US20150021597A1
公开(公告)日:2015-01-22
The present polymeric materials can be patterned with relatively low photo-exposure energies and are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. In addition, these polymeric materials can be solution-processed (e.g., by spin-coating), and can exhibit good chemical (e.g., solvent and etchant) resistance in the cured form.
Curable Polymeric Materials and Their Use for Fabricating Electronic Devices
申请人:Polyera Corporation
公开号:US20170104080A1
公开(公告)日:2017-04-13
The present teachings relate to curable linear polymers that can be used as active and/or passive organic materials in various electronic, optical, and optoelectronic devices. In some embodiments, the device can include an organic semiconductor layer and a dielectric layer prepared from such curable linear polymers. In some embodiments, the device can include a passivation layer prepared from the linear polymers described herein. The present linear polymers can be solution-processed, then cured thermally (particularly, at relatively low temperatures) and/or photochemically into various thin film materials with desirable properties.
Photopatternable Compositions and Methods of Fabricating Transistor Devices Using Same
申请人:Flexterra, Inc.
公开号:US20170227846A1
公开(公告)日:2017-08-10
The present teachings relate to compositions for forming a negative-tone photopatternable dielectric material, where the compositions include, among other components, an organic filler and one or more photoactive compounds, and where the presence of the organic filler enables the effective removal of such photoactive compounds (after curing, and during or after the development step) which, if allowed to remain in the photopatterned dielectric material, would lead to deleterious effects on its dielectric properties.