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2-(pentan-2-yl)-1H-benzo[d]imidazole

中文名称
——
中文别名
——
英文名称
2-(pentan-2-yl)-1H-benzo[d]imidazole
英文别名
2-pentan-2-yl-1H-benzimidazole
2-(pentan-2-yl)-1H-benzo[d]imidazole化学式
CAS
——
化学式
C12H16N2
mdl
MFCD09751744
分子量
188.272
InChiKey
FOTFIDVNCPGUAP-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.8
  • 重原子数:
    14
  • 可旋转键数:
    3
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.416
  • 拓扑面积:
    28.7
  • 氢给体数:
    1
  • 氢受体数:
    1

反应信息

  • 作为产物:
    描述:
    2-甲基戊醛2-碘苯胺ammonium hydroxide8-羟基喹啉caesium carbonate 、 nickel dichloride 作用下, 反应 0.22h, 以82%的产率得到2-(pentan-2-yl)-1H-benzo[d]imidazole
    参考文献:
    名称:
    微波辅助镍催化合成苯并咪唑:氨作为廉价且无毒的氮源
    摘要:
    报道了一种高效且方便的 Ni 催化 C-N 键形成,用于以简洁的方式从各种 2-卤代苯胺、醛和氨合成各种苯并咪唑。该协议使用市售的、无害的、清洁的氨作为反应伙伴,而不是其他氮源。苯并咪唑作为唯一的产品,以高到极好的收率(高达 95%)获得。
    DOI:
    10.1055/s-0037-1610843
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文献信息

  • METHOD FOR FORMING ORGANIC COATING ON COPPER SURFACE
    申请人:Rohm and Haas Electronic Materials LLC
    公开号:EP3188577A1
    公开(公告)日:2017-07-05
    A method for selective deposition of an organic solderability preservative coating on a copper surface of an article is disclosed. The method includes two steps of organic coatings by two solutions; the first step contains contacting the copper surface with a first solution including azole compound and the second step contains contacting the copper surface treated by the first solution with a second solution including a specific pyrazine derived compound.
    本发明公开了一种在物品的铜表面选择性沉积有机可焊性防腐涂层的方法。该方法包括用两种溶液进行有机涂层的两个步骤;第一步是用包括唑化合物的第一种溶液接触铜表面,第二步是用包括特定吡嗪衍生化合物的第二种溶液接触经第一种溶液处理过的铜表面。
  • 4-phenylpiperidines, their preparation and use
    申请人:The Trustees of Columbia University in the City of New York
    公开号:US10273243B2
    公开(公告)日:2019-04-30
    The present invention provides a compound having the structure: (structurally represented) wherein R1, R2, R3, R4, and R5 are each independently H, halogen, CF3 or C1-C4 alkyl; R6 is H, OH, or halogen; B is a substituted or unsubstituted heterobicycle, pyridazine, pyrazole, pyrazine, thiadiazole, or triazole, wherein the heterobicycle is other than chloro substituted indole; and the pyrazole, when substituted, is substituted with other than trifluoromethyl, or a pharmaceutically acceptable salt thereof.
    本发明提供了一种具有以下结构的化合物:(结构表示),其中 R1、R2、R3、R4 和 R5 各自独立地为 H、卤素、CF3 或 C1-C4 烷基;R6 为 H、OH 或卤素;B 为取代或未取代的杂环、哒嗪、吡唑、吡嗪、噻二唑或三唑,其中杂环为氯取代的吲哚以外的杂环;吡唑取代时为三氟甲基以外的取代基,或其药学上可接受的盐。
  • Solderability assessment
    申请人:——
    公开号:US20020067486A1
    公开(公告)日:2002-06-06
    A method for assessing the solderability of metals by spectroscopy is provided. The method includes illuminating the sample and collecting and analyzing the spectral characteristics of the sample. Specifically, the present invention effectively solves the problem of evaluating the solderability of preservative coated metals. An apparatus and software are also provided which are in particular useful to assess the solderability of preservative coated metals.
    提供了一种通过光谱评估金属可焊性的方法。该方法包括照亮样品并收集和分析样品的光谱特征。具体来说,本发明有效地解决了评估防腐涂层金属可焊性的问题。本发明还提供了一种仪器和软件,特别适用于评估防腐涂层金属的可焊性。
  • Manufacturing method of semiconductor device
    申请人:——
    公开号:US20030203624A1
    公开(公告)日:2003-10-30
    Protection film excellent in protection characteristics and easily removed by mechanical friction, is formed by enabling CMP at high rate for copper or copper-based alloy while suppressing polishing scratches, delamination, dishing and erosion, particularly, enabling CMP for copper or copper-based alloy on an easily delaminating low dielectric constant insulation film, and using plural corrosion inhibitors, for example, BTA and imidazole together in an abrasive-free polishing solution.
  • 4-PHENYLPIPERIDINES, THEIR PREPARATION AND USE
    申请人:The Trustees of Columbia University in the City of New York
    公开号:US20190031681A1
    公开(公告)日:2019-01-31
    The present invention provide a compound having the structure: (structurally represented) wherein R 1 , R 2 , R 3 , R 4 , and R 5 are each independently H, halogen, CF 3 or C 1 -C 4 alkyl; R 6 is H, OH, or halogen; B is a substituted or unsubstituted heterobicycle, pyridazine, pyrazole, pyrazine, thiadiazole, or triazole, wherein the heterocycle is other than chloro substituted indole; and the pyrazole, when substituted, is substituted with other than trifluoromethyl, or a pharmaceutically acceptable salt thereof.
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