申请人:Shipley Company, L.L.C.
公开号:US20020009663A1
公开(公告)日:2002-01-24
New photoacid generator compounds (“PAGs”) are provided and photoresist compositions that comprise such compounds. In particular, non-ionic substituted disulfone compounds PAGS are provided, including disulfone PAGs that contain a diazo, substituted methylene or hydrazine moiety interposed between substituted sulfone groups. Also provided are positive- and negative-acting chemically amplified resists that contain such PAGs and that are preferably imaged with sub-300 nm or sub-200 nm radiation such as 248 nm, 193 nm, or 157 nm radiation.
提供了新的光酸发生剂化合物(“PAGs”),以及包含这些化合物的光刻胶组合物。具体提供了非离子取代二砜化合物PAGS,包括含有二硫代磺酰基团之间的重氮基团、取代亚甲基或肼基团的二砜PAGs。还提供了包含这些PAGs的正向和负向化学增感光刻胶,最好使用小于300纳米或小于200纳米的辐射进行成像,例如248纳米、193纳米或157纳米辐射。