The effect of solvent accessible surface on Hammett-type dependencies of infinite dilution 29Si and 13C NMR shifts in ring substituted silylated phenols dissolved in chloroform and acetone
作者:Vratislav Blechta、Stanislav Šabata、Jan Sýkora、Jiří Hetflejš、Ludmila Soukupová、Jan Schraml
DOI:10.1002/mrc.2860
日期:2012.2
Infinite dilution (29)Si and (13)C NMR chemical shifts were determined from concentration dependencies of the shifts in dilute chloroform and acetone solutions of para substituted O-silylated phenols, 4-R-C6 H4 -O-SiR'2 R'' (R = Me, MeO, H, F, Cl, NMe2, NH2, and CF3), where the silyl part included groups of different sizes: dimethylsilyl (R' = Me, R'' = H), trimethylsilyl (R' = R'' = Me), tert-butyldimethylsilyl
根据对位取代的O-甲硅烷基化苯酚,4-R-C6 H4 -O-SiR'2 R'的稀氯仿和丙酮溶液中的位移的浓度依赖性,可以确定无限稀释的(29)Si和(13)C NMR化学位移。 '(R = Me,MeO,H,F,Cl,NMe2,NH2和CF3),其中甲硅烷基部分包括不同大小的基团:二甲基甲硅烷基(R'= Me,R''= H),三甲基甲硅烷基(R' = R″ = Me),叔丁基二甲基甲硅烷基(R′= Me,R″ = CMe3)和叔丁基二苯基甲硅烷基(R′= C6H5,R″ = CMe3)。讨论了硅和C-1碳化学位移对Hammett取代基常数的依赖性。结果表明,这些化学位移的取代基敏感性通过与氯仿的结合而降低,