1-苯基苯并[ b ]噻吩三氟甲磺酸盐在180℃下的热分解导致苯基迁移,从而以高收率得到2-苯基苯并[ b ]噻吩。有趣的是,在2位具有取代基的1-苯基苯并[ b ]噻吩三氟甲磺酸酯的热解得到相应的3-苯基苯并[ b ]噻吩。基于2-(4-甲基苯基)-1-苯基苯并[ b ]噻吩鎓三氟甲磺酸酯的热解,提出了连续的[1,5]σ重排用于苯基迁移。
Novel [4 + 2]-Cycloaddition of 1-Phenyl-1-benzothiophenium Salts with Dienes. Experimental Evidence for a Lack of Aromaticity in the Thiophene Ring
作者:Tsugio Kitamura、Bian-Xiang Zhang、Yuzo Fujiwara
DOI:10.1021/jo020406p
日期:2003.2.1
The [4 + 2]-cycloaddition reaction of 1-phenyl-1-benzothiophenium triflates has been conducted for the first time. [4 + 2]-Cycloaddition with dienes such as cyclopentadiene and 1,3-diphenylisobenzofuran occurs successfully to give cycloadducts. This result indicates that the C=C bond of the thiophene ring acts as a 2pi electron component in the cycloadditionreaction. Cycloadducts were formed in high
Photolysis of 1-phenylbenzo[b]thiophenium salts was conducted by use of a Pyrex-filtered high-pressure Hg lamp. The major products in most cases were the phenyl-migrated ones, i.e., 2-phenylbenzo[b]thiophenes and 3-phenylbenzo[b]thiophenes, together with the dephenylated benzo[b]thiophenes. This photochemical behavior is quite different from the thermal ones that provide the ring-opened olefins. The
Photoacid generator systems for short wavelength imaging
申请人:Shipley Company, L.L.C.
公开号:US20030013049A1
公开(公告)日:2003-01-16
New photoacid generator systems that comprise a sensitizer compound and one or more photoacid generator compounds are provided and photoresist compositions that comprise such systems. Photoacid generator systems of the invention are particularly useful as photoactive components of photoresists imaged at short wavelengths such as 248 nm, 193 nm and 157 nm.
Photoacid generators and photoresists comprising same
申请人:Shipley Company, L.L.C.
公开号:US06664022B1
公开(公告)日:2003-12-16
New photoacid generator compounds (“PAGs”) are provided and photoresist compositions that comprise such compounds. In particular, ionic PAGs are provided that include tri-naphthyl sulfonium, thienyl iodonium, thienyl sulfonium, pentafluorophenyl iodonium and pentafluorophenyl sulfonium compounds. PAGs of the invention are particularly useful as photoactive components of photoresists imaged at short wavelengths such as sub-300 nm, sub-200 nm and sub-160 nm such as 248 nm, 193 nm and 157 nm.