New photoacid generator compounds (“PAGs”) are provided and photoresist compositions that comprise such compounds. In particular, ionic PAGs are provided that include tri-naphthyl sulfonium, thienyl iodonium, thienyl sulfonium, pentafluorophenyl iodonium and pentafluorophenyl sulfonium compounds. PAGs of the invention are particularly useful as photoactive components of photoresists imaged at short wavelengths such as sub-300 nm, sub-200 nm and sub-160 nm such as 248 nm, 193 nm and 157 nm.
提供了新的光酸发生剂化合物(“PAGs”),以及包含这些化合物的光阻组合物。具体而言,提供了包括三
萘基
硫鎓、
噻吩基
碘鎓、
噻吩基
硫鎓、
五氟苯基
碘鎓和
五氟苯基
硫鎓化合物的离子PAGs。本发明的PAGs特别适用于在短波长下成像的光阻的光活性成分,例如在248nm,193nm和157nm等小于300nm、小于200nm和小于160nm的波长下。