申请人:BASF Aktiengesellschaft
公开号:US05072034A1
公开(公告)日:1991-12-10
4-alkoxy-2-hydroxybenzophenone-5-sulfonic acids of the general formula I ##STR1## where R.sup.1 is C.sub.1 -C.sub.20 -alkyl which is unsubstituted or substituted by halogen, cyanao, hydroxyl, C.sub.1 -C.sub.20 -alkoxy, C.sub.2 -C.sub.20 -alkoxycarbonyl, acyloxy and/or phenyl which is unsubstituted or substituted by C.sub.1 -c.sub.4 -alkyl, C.sub.1 -C.sub.4 -alkoxy and/or halogen, R.sup.2 and R.sup.3 independently of one another are each hydrogen, halogen, C.sub.1 -C.sub.12 -alkyl, C.sub.1 -C.sub.12 -alkoxy, C.sub.1 -C.sub.4 -haloalkyl, C.sub.3 -C.sub.8 -cycloalkyl, C.sub.4 -C.sub.12 -cycloalkylalkyl, cyano, hydroxyl or hydroxyethyl or are each phenoxy, C.sub.7 -C.sub.10 -phenalkyl or phenyl which is unsubstituted or substituted by C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.sub.4 -alkoxy and/or halogen, and R.sup.4 is hydrogen or sulfo, are prepared by reacting a 4-alkoxy-2-hydroxybenzophenone of the general formula II ##STR2## with chlorosulfonic acid at from -20.degree. to +100.degree. C., by a novel and improved process in which the reaction is carried out in an aliphatic, cycloaliphatic and/or aromatic carboxylate as solvent.
通用公式I的4-烷氧基-2-羟基苯基酮-5-磺酸的化合物,其中R.sup.1是未取代或取代的C.sub.1-C.sub.20-烷基,取代基包括卤素、氰基、羟基、C.sub.1-C.sub.20-烷氧基、C.sub.2-C.sub.20-烷氧羰基、酰氧基和/或苯基,苯基未取代或取代的基团包括C.sub.1-C.sub.4-烷基、C.sub.1-C.sub.4-烷氧基和/或卤素,R.sup.2和R.sup.3独立地为氢、卤素、C.sub.1-C.sub.12-烷基、C.sub.1-C.sub.12-烷氧基、C.sub.1-C.sub.4-卤代烷基、C.sub.3-C.sub.8-环烷基、C.sub.4-C.sub.12-环烷基烷基、氰基、羟基或羟乙基,或者为各自的苯氧基、C.sub.7-C.sub.10-苯基烷基或苯基,未取代或取代的基团包括C.sub.1-C.sub.4-烷基、C.sub.1-C.sub.4-烷氧基和/或卤素,R.sup.4为氢或磺酰基,通过将通用公式II的4-烷氧基-2-羟基苯基酮与氯磺酸在-20度至+100度C之间反应而制备,所述反应在脂肪族、环脂族和/或芳香族羧酸酯作为溶剂的新颖改进过程中进行。